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1. (WO2010113675) SUBSTRATE CLEANING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2010/113675 International Application No.: PCT/JP2010/054788
Publication Date: 07.10.2010 International Filing Date: 19.03.2010
IPC:
H01L 21/304 (2006.01) ,G02F 1/13 (2006.01) ,G02F 1/1333 (2006.01) ,G03F 7/42 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
42
Stripping or agents therefor
Applicants:
緒方 正一 OGATA, Shohichi; null (UsOnly)
菅長 大輔 SUGANAGA, Daisuke; null (UsOnly)
吉田 昌弘 YOSHIDA, Masahiro; null (UsOnly)
シャープ株式会社 SHARP KABUSHIKI KAISHA [JP/JP]; 大阪府大阪市阿倍野区長池町22番22号 22-22, Nagaike-cho, Abeno-ku, Osaka-shi, Osaka 5458522, JP (AllExceptUS)
住友精密工業株式会社 SUMITOMO PRECISION PRODUCTS CO., LTD. [JP/JP]; 兵庫県尼崎市扶桑町1番10号 1-10, Fuso-cho, Amagasaki-shi, Hyogo 6600891, JP (AllExceptUS)
Inventors:
緒方 正一 OGATA, Shohichi; null
菅長 大輔 SUGANAGA, Daisuke; null
吉田 昌弘 YOSHIDA, Masahiro; null
Agent:
深見 久郎 FUKAMI, Hisao; 大阪府大阪市北区中之島二丁目2番7号 中之島セントラルタワー 特許業務法人深見特許事務所 Fukami Patent Office, p.c., Nakanoshima Central Tower 2-7, Nakanoshima 2-chome, Kita-ku, Osaka-shi, Osaka 5300005, JP
Priority Data:
2009-08526731.03.2009JP
Title (EN) SUBSTRATE CLEANING DEVICE
(FR) DISPOSITIF DE NETTOYAGE DE SUBSTRAT
(JA) 基板洗浄装置
Abstract:
(EN) A substrate cleaning device (1A) is equipped with a circulation route, a concentration sensor (21), and a control unit (26). The circulation route includes a cleaning tank (10) that uses an aqueous solution of hydrogen peroxide and chelating agents (100) to clean a glass substrate (200), a storage tank (16) that temporarily stores the aqueous solution of hydrogen peroxide and chelating agents (100), and a delivery pipe (18) and a return pipe (15) that connect the cleaning tank (10) and the storage tank (16). The concentration sensor (21) is disposed on the delivery pipe (18) and is for detecting the concentration of the aqueous solution of hydrogen peroxide and chelating agents (100). The control unit (26) controls the concentration of the aqueous solution of hydrogen peroxide and chelating agents (100) by supplying a given amount of pure water to the storage tank (16) on the basis of concentration information detected by the concentration sensor (21). As a result of this configuration, the substrate cleaning device is capable of suppressing changes in the concentration of the aqueous solution of hydrogen peroxide and chelating agents, thereby reducing materials costs for the aqueous solution of hydrogen peroxide and chelating agents being used.
(FR) L'invention concerne un dispositif de nettoyage de substrat (1A) doté d'un trajet de circulation, d'un capteur de concentration (21), et d'une unité de commande (26). Le trajet de circulation comprend un réservoir de nettoyage (10) utilisant une solution aqueuse de peroxyde d'hydrogène et de chélateurs (100) pour nettoyer un substrat de verre (200), un réservoir de stockage (16) stockant temporairement la solution aqueuse de peroxyde d'hydrogène et les chélateurs (100), et un tuyau de distribution (18) et un tuyau de retour (15) raccordant le réservoir de nettoyage (10) et le réservoir de stockage (16). Le capteur de concentration (21) est disposé sur le tuyau de distribution (18) et est destiné à détecter la concentration de la solution aqueuse de peroxyde d'hydrogène et de chélateurs (100). L'unité de commande (26) contrôle la concentration de la solution aqueuse de peroxyde d'hydrogène et de chélateurs (100) en fournissant une quantité donnée d'eau pure au réservoir de stockage (16) sur la base des informations de concentration détectées par le capteur de concentration (21). En conséquence, avec cette configuration, le dispositif de nettoyage de substrat peut supprimer les changements de concentration de la solution aqueuse de peroxyde d'hydrogène et de chélateurs, réduisant ainsi les coûts de matières pour la solution aqueuse utilisée contenant du peroxyde d'hydrogène et des chélateurs.
(JA)  基板洗浄装置(1A)は、循環路と、濃度センサ(21)と、制御部(26)とを備える。循環路は、キレート過水液(100)を用いてガラス基板(200)の洗浄を行なう洗浄槽(10)と、キレート過水液(100)を一時的に貯留する貯留槽(16)と、これら洗浄槽(10)および貯留槽(16)を接続する送り管(18)および戻し管(15)とを含んでいる。濃度センサ(21)は、キレート過水液(100)の濃度を検出するためのものであり、送り管(18)に設けられている。制御部(26)は、濃度センサ(21)によって検出された濃度情報に基づいて所定量の純水を貯留槽(16)に供給することでキレート過水液(100)の濃度管理を行なう。このように構成することにより、キレート過水液の濃度変化を抑制することが可能であり、その結果、使用するキレート過水液の材料費を低減することが可能な基板洗浄装置とすることができる。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)