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Machine translation
1. (WO2010112827) METHOD AND APPARATUS FOR PRODUCING THREE DIMENSIONAL NANO AND MICRO SCALE STRUCTURES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/112827    International Application No.:    PCT/GB2010/000599
Publication Date: 07.10.2010 International Filing Date: 29.03.2010
IPC:
H01J 37/305 (2006.01)
Applicants: THE SECRETARY OF STATE FOR BUSINESS INNOVATION AND SKILLS OF HER MAJESTY'S BRITANNIC GOVERNMENT [GB/GB]; 1 Victoria Street London SW1 0ET (GB) (For All Designated States Except US).
UNIVERSITY OF SURREY [GB/GB]; Guilford Surrey GU1 7XH (GB) (For All Designated States Except US).
COX, David [GB/GB]; (GB) (For US Only)
Inventors: COX, David; (GB)
Agent: JEHAN, Robert; Williams Powell Staple Court 11 Staple Inn Buildings London WC1V 7QH (GB)
Priority Data:
0905571.6 31.03.2009 GB
Title (EN) METHOD AND APPARATUS FOR PRODUCING THREE DIMENSIONAL NANO AND MICRO SCALE STRUCTURES
(FR) PROCÉDÉ ET APPAREIL DE FABRICATION DE NANOSTRUCTURES ET DE MICROSTRUCTURES EN TROIS DIMENSIONS
Abstract: front page image
(EN)A three-dimensional milling method and apparatus is disclosed for milling micrometre and a nanometre scale three-dimensional structures. The apparatus includes an ion column (12) operable to generate a milling beam onto a substrate (20) held on an instrument stage (18). A patterning computer (22) is operable to control the ion column (12) to generate varying ion beam and/or dwell times or to produce a plurality of milling passes, in which subsequent passes overlap previous passes at least partially to create three-dimensional structures. Optionally, an SEM column (14) may be provided.
(FR)L'invention concerne un procédé et un appareil de fraisage en trois dimensions destinés à fraiser des structures micrométriques et nanométriques en trois dimensions. L'appareil comprend une colonne ionique (12) capable de générer un faisceau de fraisage vers un substrat (20) maintenu sur un support d'instrument (18). Une unité de reproduction de motifs (22) est capable de contrôler la colonne ionique (12) afin de générer différentes durées de faisceaux ioniques et/ou de séjour ou de produire une pluralité de fraisages, les fraisages ultérieurs chevauchant les fraisages antérieurs au moins partiellement afin de créer des structures en trois dimensions. Eventuellement, une colonne de microscopie à balayage électronique (14) peut être prévue.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)