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1. (WO2010111972) DUAL WAFER STAGE EXCHANGING SYSTEM FOR LITHOGRAPHIC DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2010/111972 International Application No.: PCT/CN2010/071547
Publication Date: 07.10.2010 International Filing Date: 02.04.2010
IPC:
G03F 7/20 (2006.01) ,H01L 21/68 (2006.01) ,H01L 21/027 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68
for positioning, orientation or alignment
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants:
朱煜 ZHU, Yu [CN/CN]; CN (UsOnly)
张鸣 ZHANG, Ming [CN/CN]; CN (UsOnly)
汪劲松 WANG, Jingsong [CN/CN]; CN (UsOnly)
田丽 TIAN, Li [CN/CN]; CN (UsOnly)
徐登峰 XU, Dengfeng [CN/CN]; CN (UsOnly)
尹文生 YIN, Wensheng [CN/CN]; CN (UsOnly)
段广洪 DUAN, Guanghong [CN/CN]; CN (UsOnly)
胡金春 HU, Jinchun [CN/CN]; CN (UsOnly)
清华大学 TSINGHUA UNIVERSITY [CN/CN]; 中国北京市 海淀区100084信箱82分箱清华大学专利办公室 Post Box 100084 Branch 82, Tsinghua University Patent Office, Haidian District Beijing 100084, CN (AllExceptUS)
Inventors:
朱煜 ZHU, Yu; CN
张鸣 ZHANG, Ming; CN
汪劲松 WANG, Jingsong; CN
田丽 TIAN, Li; CN
徐登峰 XU, Dengfeng; CN
尹文生 YIN, Wensheng; CN
段广洪 DUAN, Guanghong; CN
胡金春 HU, Jinchun; CN
Agent:
北京鸿元知识产权代理有限公司 BEIJING GRANDERIP LAW FIRM; 中国北京市 朝阳区朝阳门外大街19号华普国际大厦519 Suite 519, Huapu International Plaza No.19, Chaoyang Men Wai Avenue, Chaoyang District Beijing 100020, CN
Priority Data:
200910131506.503.04.2009CN
Title (EN) DUAL WAFER STAGE EXCHANGING SYSTEM FOR LITHOGRAPHIC DEVICE
(FR) SYSTÈME D'ÉCHANGE DE DOUBLE PORTE-PLAQUETTE POUR DISPOSITIF LITHOGRAPHIQUE
(ZH) 一种光刻机硅片台双台交换系统
Abstract:
(EN) A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two wafer stages are set on a base and suspended above the upper surface of the base by air bearings. Each of the two wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary driving units with single degree of freedom.
(FR) L'invention concerne un système d'échange de double porte-plaquette pour un dispositif lithographique, ce système comprenant deux porte-plaquettes se déplaçant entre un poste d'exposition et un poste de prétraitement, et lesdits porte-plaquettes étant placés sur une base et suspendus au-dessus de la surface supérieure de la base par des paliers à air. Chacun des deux porte-plaquettes est traversé par un rail-guide respectif orienté dans la direction Y, une extrémité dudit rail-guide étant connectée à une unité de commande principale et l'autre extrémité dudit rail-guide étant reliée de façon détachable à l'une des deux unités de commande auxiliaires à un seul degré de liberté dans la direction X, et les deux porte-plaquettes peuvent se déplacer dans la direction Y le long des rails-guides et dans la direction X lorsqu'ils sont commandés par les unités de commande auxiliaires à un seul degré de liberté. Le changement de position des deux porte-plaquettes peut être déclenché par déconnexion et connexion des rails-guides orientés dans la direction Y et des unités de commande auxiliaires à un seul degré de liberté.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)