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1. WO2010094719 - CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER

Publication Number WO/2010/094719
Publication Date 26.08.2010
International Application No. PCT/EP2010/052004
International Filing Date 17.02.2010
IPC
H01J 37/16 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
16Vessels; Containers
H01J 37/18 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
18Vacuum locks
H01J 37/20 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
H01J 37/305 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
305for casting, melting, evaporating, or etching
H01J 37/317 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
CPC
B82Y 10/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
10Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
B82Y 40/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
40Manufacture or treatment of nanostructures
H01J 2237/16
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
16Vessels
H01J 37/16
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
16Vessels; Containers
H01J 37/165
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
16Vessels; Containers
165Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays
H01J 37/18
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
18Vacuum locks ; ; Means for obtaining or maintaining the desired pressure within the vessel
Applicants
  • MAPPER LITHOGRAPHY IP B.V. [NL]/[NL] (AllExceptUS)
  • DE BOER, Guido [NL]/[NL] (UsOnly)
  • BALTUSSEN, Sander [NL]/[NL] (UsOnly)
  • JAGER, Remco [NL]/[NL] (UsOnly)
  • PEIJSTER, Jerry, Johannes, Martinus [NL]/[NL] (UsOnly)
  • TEEPEN, Tijs, Frans [NL]/[NL] (UsOnly)
  • VAN NIEUWSTADT, Joris, Anne, Henri [NL]/[NL] (UsOnly)
  • WEEDA, Willem, Maurits [NL]/[NL] (UsOnly)
  • VAN VEEN, Alexander, Hendrik, Vincent [NL]/[NL] (UsOnly)
Inventors
  • DE BOER, Guido
  • BALTUSSEN, Sander
  • JAGER, Remco
  • PEIJSTER, Jerry, Johannes, Martinus
  • TEEPEN, Tijs, Frans
  • VAN NIEUWSTADT, Joris, Anne, Henri
  • WEEDA, Willem, Maurits
  • VAN VEEN, Alexander, Hendrik, Vincent
Agents
  • MOOIJ, Maarten
Priority Data
61/154,41522.02.2009US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER
(FR) APPAREIL DE LITHOGRAPHIE À PARTICULES CHARGÉES ET PROCÉDÉ DE GÉNÉRATION DE VIDE DANS UNE CHAMBRE À VIDE
Abstract
(EN)
The invention relates to a charged particle lithography apparatus (100) with a charged particle source (101) for creating one or more charged particle beams (123), a charged particle projector (108, 109, 110) for projecting the beams onto a wafer; and a moveable wafer stage (132) for carrying the wafer (130). The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber (140) forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.
(FR)
La présente invention concerne un appareil de lithographie à particules chargées (100) qui comporte une source de particules chargées (101) permettant de créer un ou plusieurs faisceaux de particules chargées (123), un projecteur de particules chargées (108, 109, 110) permettant de projeter les faisceaux sur une tranche ; un étage de tranche mobile (132) permettant de transporter la tranche (130). La source de particules chargées, le projecteur de particules chargées et l'étage de tranche mobile sont disposés dans une chambre à vide commune (140) qui forme un environnement à vide. La chambre à vide comporte également une ouverture permettant de charger des tranches dans la chambre, ainsi qu'une porte.
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