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1. WO2010094661 - NANOLITHOGRAPHY PROCESS

Publication Number WO/2010/094661
Publication Date 26.08.2010
International Application No. PCT/EP2010/051880
International Filing Date 16.02.2010
IPC
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/027 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
CPC
B82Y 10/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
10Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
B82Y 40/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
40Manufacture or treatment of nanostructures
C08F 222/1006
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
222Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
10Esters
1006of polyhydric alcohols or polyhydric phenols
G03F 7/0002
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
G03F 7/0046
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
0046with perfluoro compounds, e.g. for dry lithography
G03F 7/027
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Applicants
  • SOLVAY SOLEXIS S.p.A. [IT]/[IT] (AllExceptUS)
  • KOO, Namil [KR]/[DE] (UsOnly)
  • PLACHETKA, Ulrich [DE]/[DE] (UsOnly)
  • MOORMANN, Christian [DE]/[DE] (UsOnly)
Inventors
  • KOO, Namil
  • PLACHETKA, Ulrich
  • MOORMANN, Christian
Agents
  • BENVENUTI, Federica
Priority Data
09153205.119.02.2009EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) NANOLITHOGRAPHY PROCESS
(FR) PROCÉDÉ DE NANOLITHOGRAPHIE
Abstract
(EN)
The invention pertains to a method for replicating a pattern, said method comprising: (a) providing patterned template, wherein said patterned template comprises a patterned template surface having a plurality of recessed or protruded areas formed therein; (b) contacting a volume of a curable perfluoropolyether composition [composition (C)] with said patterned template surface, said composition comprising: - at least one functional perfluoropolyether compound [compound (E)], said compound (E) comprising a (per)fluoropolyoxyalkylene chain [chain (Rf)], wherein the molecular weight of said chain Rf is more than 1000 and less than 3500; and at least two unsaturated moieties; and - at least one photoinitiator; (c) submitting to UV radiations said composition (C) to yield a mould comprising a patterned mould surface, and separating said mould from said patterned template; (d) contacting said patterned mould surface with a (pre)polymer composition [composition (P)]; (e) processing said composition (P) to yield an article having a patterned surface, and separating said article from said mould.
(FR)
L'invention concerne un procédé de reproduction d'un motif, ledit procédé consistant :(a) à utiliser un modèle de motif, ledit modèle de motif comportant une surface de modèle de motif ayant une pluralité de zones en creux ou en saillie formées dans celle-ci; (b) à mettre en contact un volume d'une composition de polyéther perfluoré pouvant durcir [composition (C)] avec ladite surface de modèle de motif, ladite composition comportant : au moins un composé polyéther perfluoré fonctionnel [composé (E)], ledit composé (E) comportant une chaîne de (per)fluoropolyoxyalkylène [chaîne (Rf)], la masse moléculaire de ladite chaîne Rf étant supérieure à 1 000 et inférieure à 3 500, au moins deux fractions insaturées, et au moins un photo-initiateur;(c) à soumettre ladite composition (C) à des rayons UV pour produire un moule comportant une surface de moule à motif et à séparer ledit moule dudit modèle de motif; (d) à mettre en contact ladite surface de moule à motif avec une composition de (pré)polymère [composition (P)]; (e) à transformer ladite composition (P) pour produire un article ayant une surface à motif et à séparer ledit article dudit moule.
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