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1. WO2010083319 - FUNGICIDAL COMPOSITIONS INCLUDING HYDRAZONE DERIVATIVES AND COPPER

Note: Text based on automatic Optical Character Recognition processes. Please use the PDF version for legal matters

CLAIMS:

1. A compound of Formula 1


Formula 1

wherein Rl is CH3 or CH2CH3;

Y2 is H, halogen, hydroxyl, nitro, cyano, C1-C4 alkyl, C1-C4 alkoxy, C1-C4 fluoroalkyl, and C1-C4 fluoroalkoxy,

Y3, Y4, Y5, and Y6 are independently selected from the group consisting of halogen, nitro, cyano, C1-C4 alkyl, C1-C4 alkoxy, C1-C4 fluoroalkyl, and C1-C4 fluoroalkoxy;

with the proviso that

Y2, Y3, Y4, Y5, and Y6 are not all H;

if Y3, Y4, Y5, and Y6 are all H, Y2 is not hydroxyl, Cl, or F;

if Y2, Y3, Y5, and Y6 are all H and Rl is CH3, Y4 is not CH3, OCH2CH3, or ϊ-butyl;

if Y2, Y3, Y5, and Y6 are all H, Y4 is not F or Br;

if Y2, Y5, and Y6 are H, Y3 and Y4 are not both 0CH3;

if R is CH3 and Y2, Y4, and Y6 are H, Y3 and Y4 are not both 0CH3 or NO2; and if R CH2CH3 and Y2 and Y6 are H, Y3, Y4, and Y5 are not all 0CH3.

2. The compound of claim 1, wherein

Rl is CH3; and

Y2, Y3, Y4, Y5, and Y6 are independently selected from the group consisting of halogen, hydroxyl, nitro, cyano, C1-C4 alkyl, C1-C4 alkoxy, triflouromethyl, CH3, triflouromethoxy, and 0CH3.

3. The compound of claim 2, wherein

Y2, Y3, Y4, Y5, and Y6 are independently selected from the group consisting of hydroxyl, Cl, Br, nitro, cyano, CH3, 0CH3, triflouromethyl, CH3, triflouromethoxy, and 0CH3.

4. A synergistic mixture including a compound of claim 1 and copper.

5. Use of the synergistic mixture of claim 4 for controlling the growth of fungal pathogens of plants.

6. Use of the synergistic mixture of claim 4 for controlling the growth of fungal of mammals.

7. Use of the synergistic mixture of claim 4 for controlling the growth of fungi on inert substrates selected from the group consisting essentially of wood, metal, and plastic.

8. Use of the synergistic mixture of claim 4 for controlling the growth of fungi belonging to at least one of Ascomycete, Basidiomycete, Oomycete, and Deuteromycete classes of fungi.

9. The mixture of synergistic claim 4, wherein the fungi is selected from the group consisting of Phytophthora species, Plasmopara viticola, P seudoperonospora cubensis, Pythium species, Pyricularia oryzae, Colletotrichum species, Helminthosporium species, Altemaria species, Septoria nodorum, Leptosphaeria nodorum, Ustilago maydis, Erysiphe graminis, Puccinia species, Sclerotinia species, Sphaerotheca fuliginea, Cercospora species, Rhizoctonia species, Uncinula necator and Podosphaera leucotricha.

10. The synergistic mixture of claim 4, wherein a growth inhibiting amount of a compound of Formula 1 in mixture with copper is provided as a mixture in which the total molar ratio of copper to the compound of claim 1 exceeds 1:1.

11. The synergistic mixture of claim 1 , wherein a growth inhibiting amount of a compound of Formula 1 is provided as an isolated hydrazone-copper complex in which the molar ratio of the copper to the compound of claim 1 is one of 1 : 1 and 1:2.

12. The synergistic mixture of claim 1, wherein the compound of Formula 1 to be combined with copper is complexed with a metal.

13. The synergistic mixture of claim 12, wherein the metal complexed with the compound of Formula 1 is selected from the group consisting essentially of Cu+, Cu2+, Fe2+, Fe3+, Zn2+, and Mn2+.

14. The synergistic mixture of claim 1, wherein the copper is provided as at least one of the group consisting of copper oxychloride, copper octanoate, copper ammonium carbonate, copper arsenate, copper oxysulfate, copper formate, copper propionate, copper oxyacetate, copper citrate, copper chloride, copper diammonium chloride, copper nitrate, copper carbonate, copper phosphate, copper pyrophosphate, copper disodium EDTA, copper diammonium EDTA, copper oxalate, copper tartrate, copper gluconate, copper glycinate, copper glutamate, copper aspartate, copper adipate, copper palmitate, copper stearate, copper caprylate, copper decanoate, copper undecylenate, copper neodecanoate, copper linoleate, copper oleate, copper borate, copper methanesulfonate, copper sulfamate, copper acetate, copper hydroxide, copper oxide, copper oxychloride-sulfate, copper sulfate, basic copper sulfate, copper-oxine, copper 3-phenylsalicylate, copper chloride hydroxide, copper dimethyldithiocarbamate, ammonium copper sulfate, copper magnesium sulfate, coppernaphthenate, copper ethanolamine, chromated copper arsenate, ammoniacal copper arsenate, ammoniacal copper zinc arsenate, ammoniacal copper borate, Bordeaux mixture, copper zinc chromate, cufraneb, cupric hydrazinium sulfate, cuprobam, nano-copper materials, and copper didecyldimethylammonium chloride.