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1. (WO2010080472) ELECTRON-TRANSPORTING MATERIALS COMPRISING AND PROCESSES FOR MAKING THE SAME
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/080472 International Application No.: PCT/US2009/068392
Publication Date: 15.07.2010 International Filing Date: 17.12.2009
IPC:
C07D 401/14 (2006.01) ,H01L 51/05 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
401
Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
14
containing three or more hetero rings
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
05
specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier
Applicants:
GENERAL ELECTRIC COMPANY [US/US]; 1 River Road Schenectady, NY 12345, US (AllExceptUS)
CHICHAK, Kelly, Scott [CA/US]; US (UsOnly)
YE, Qing [CN/US]; US (UsOnly)
LIANG, Yangang [CN/CN]; CN (UsOnly)
LIU, Shengxia [CN/CN]; CN (UsOnly)
WANG, Rui [CN/CN]; CN (UsOnly)
Inventors:
CHICHAK, Kelly, Scott; US
YE, Qing; US
LIANG, Yangang; CN
LIU, Shengxia; CN
WANG, Rui; CN
Agent:
DIMAURO, Peter, T.; General Electric Company Global Patent Operation PO Box 861 2 Corporate Drive, Suite 648 Shelton, CT 06484, US
Priority Data:
12/350,62908.01.2009US
Title (EN) ELECTRON-TRANSPORTING MATERIALS COMPRISING AND PROCESSES FOR MAKING THE SAME
(FR) MATÉRIAUX DE TRANSPORT D'ÉLECTRONS ET PROCÉDÉS DE FABRICATION ASSOCIÉS
Abstract:
(EN) Compound of formula C is made by reacting a compound of formula A with an pyridyl boronic acid or pyridyl borate esier to form a compound of formula B; and combining the compound of formula B with a pyridyl dihalide to form the compound of C; wherein R3 R4, R5, R6 and R7 are, independently at each occurrence, a C1-C20 aliphatic radical, a C3-C20 aromatic radical or a C3-C20, cycioaliphatic radical; X is. independently at each occurrence, CH or N; Y is chloro or bromo; Z is bromo or iodo: and when Y is bromo, Z is iodo; d, e, and g are, independently at each occurrence, an integer ranging from 0-4; f is an integer ranging from 0-2; and h is an integer ranging from 0-3.
(FR) La présente invention concerne un composé de formule C obtenu en faisant réagir le composé de formule A avec un acide pyridylboronique ou un borate de pyridyle pour former un composé de formule B, et en combinant le composé de formule B avec un dihalogénure de pyridyle pour former le composé C dans lequel R3, R4, R5, R6 et R7 représentent indépendamment à chaque occurrence un radical aliphatique en C1-C20, un radical aromatique en C3-C20 ou un radical cycloaliphatique en C3-C20 ; X représente indépendamment à chaque occurrence CH or N ; Y représente un groupe bromo ou chloro ; Z représente un groupe bromo ou iodo, et quand Y est un brome, Z est un iode ; d, e et g représentent indépendamment à chaque occurrence un entier valant de 0 à 4 ; f est un entier valant de 0 à 2 ; et h est un entier valant de 0 à 3.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP2385941JP2012514640CN102272123KR1020110114622