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1. (WO2010079784) POLYPROPYLENE RESIN COMPOSITION FOR MICROPOROUS FILM FORMATION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/079784 International Application No.: PCT/JP2010/050040
Publication Date: 15.07.2010 International Filing Date: 06.01.2010
IPC:
C08J 9/26 (2006.01) ,C08K 3/00 (2006.01) ,C08L 23/06 (2006.01) ,C08L 23/12 (2006.01) ,H01G 9/02 (2006.01) ,H01M 2/16 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
9
Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
26
by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
3
Use of inorganic ingredients
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
23
Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
02
not modified by chemical after-treatment
04
Homopolymers or copolymers of ethene
06
Polyethene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
23
Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
02
not modified by chemical after-treatment
10
Homopolymers or copolymers of propene
12
Polypropene
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
G
CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
9
Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
004
Details
02
Diaphragms; Separators
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
M
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
2
Constructional details, or processes of manufacture, of the non-active parts
14
Separators; Membranes; Diaphragms; Spacing elements
16
characterised by the material
Applicants:
三井化学株式会社 MITSUI CHEMICALS, INC. [JP/JP]; 東京都港区東新橋一丁目5番2号 5-2, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057117, JP (AllExceptUS)
株式会社プライムポリマー PRIME POLYMER CO., LTD. [JP/JP]; 東京都港区東新橋一丁目5番2号 5-2, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057117, JP (AllExceptUS)
田村 聡 TAMURA, Satoshi [JP/JP]; JP (UsOnly)
板倉 啓太 ITAKURA, Keita [JP/JP]; JP (UsOnly)
津乗 良一 TSUNORI, Ryoichi [JP/JP]; JP (UsOnly)
橋詰 聡 HASHIZUME, Satoshi [JP/JP]; JP (UsOnly)
Inventors:
田村 聡 TAMURA, Satoshi; JP
板倉 啓太 ITAKURA, Keita; JP
津乗 良一 TSUNORI, Ryoichi; JP
橋詰 聡 HASHIZUME, Satoshi; JP
Agent:
特許業務法人SSINPAT SSINPAT PATENT FIRM; 東京都品川区西五反田七丁目13番6号 五反田山崎ビル6階 Gotanda Yamazaki Bldg. 6F, 13-6, Nishigotanda 7-chome, Shinagawa-ku, Tokyo 1410031, JP
Priority Data:
2009-00195707.01.2009JP
Title (EN) POLYPROPYLENE RESIN COMPOSITION FOR MICROPOROUS FILM FORMATION
(FR) COMPOSITION DE RÉSINE DE POLYPROPYLÈNE POUR LA FORMATION DE FILMS MICROPOREUX
(JA) 微多孔膜形成用ポリプロピレン樹脂組成物
Abstract:
(EN) Provided is a polypropylene resin composition for microporous film formation having excellent heat resistance and a low heat-shrinkage ratio. This polypropylene resin composition for microporous film formation has as an essential component a propylene monopolymer (A) which meets the following conditions (1)-(4) and (7). (1) The limiting viscosity [η] is 1 dl/g or greater but less than 7 dl/g. (2) The mesopentad fraction is in the range of 94.0-99.5%. (3) When the temperature increases, the integral elution quantity up to 100°C is 10% or less. (4) The melting point is 153-167°C. (7) For the elution temperature-elution quantity curve, the peak top temperature of the maximum peak is 105-130°C and the half-value width of said peak is 7.0°C or less.
(FR) L'invention porte sur une composition de résine de polypropylène pour la formation de films microporeux ayant une excellente résistance à la chaleur et un faible taux de retrait thermique. Cette composition de résine de polypropylène pour la formation de films microporeux a comme composant essentiel un homopolymère du propylène (A) qui satisfait aux conditions (1) à (4) et (7) suivantes. (1) La viscosité intrinsèque [η] est supérieure ou égale à 1 dl/g mais inférieure à 7 dl/g. (2) La fraction de mésopentade est comprise dans la plage de 94,0 à 99,5 %. (3) Lorsque la température augmente, la quantité éluée intégrale jusqu'à 100°C est inférieure ou égale à 10 %. (4) Le point de fusion est de 153 à 167°C. (7) Pour la courbe de température d'élution - quantité éluée, la température au sommet du pic maximal est de 105 à 130°C et la largeur à mi-hauteur dudit pic est inférieure ou égale à 7,0°C.
(JA) [課題]耐熱性に優れ、かつ熱収縮率の低い微多孔膜形成用ポリプロピレン樹脂組成物を提供すること。 [解決手段]本発明の微多孔膜形成用ポリプロピレン樹脂組成物は、下記要件(1)~(4)および(7)を満たすプロピレン単独重合体(A)を必須成分とする。 (1)極限粘度[η]が1dl/g以上7dl/g未満であること、(2)メソペンタッド分率が94.0~99.5%の範囲にあること、(3)昇温時の100℃までの溶出積分量が10%以下であること、(4)融点が153~167℃であること、(7)溶出温度-溶出量曲線において、最大ピークのピークトップ温度が105~130℃に存在し、かつ該ピークの半値幅が7.0℃以下であること。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
EP2374839JPWO2010079784US20110294016CN102272207KR1020110107814