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1. (WO2010079771) METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK FOR EXPOSURE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/079771 International Application No.: PCT/JP2010/050010
Publication Date: 15.07.2010 International Filing Date: 05.01.2010
IPC:
G01N 21/64 (2006.01) ,G01N 21/958 (2006.01) ,G03F 1/00 (2012.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
62
Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
63
optically excited
64
Fluorescence; Phosphorescence
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
95
characterised by the material or shape of the object to be examined
958
Inspecting transparent materials
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Applicants:
HOYA株式会社 HOYA CORPORATION [JP/JP]; 東京都新宿区中落合2丁目7番5号 7-5, Naka-Ochiai 2-chome, Shinjuku-ku, Tokyo 1618525, JP (AllExceptUS)
田辺 勝 TANABE, Masaru [JP/JP]; JP (UsOnly)
Inventors:
田辺 勝 TANABE, Masaru; JP
Agent:
池田 憲保 IKEDA, Noriyasu; 東京都千代田区内幸町1丁目2番2号 日比谷ダイビル Hibiya Daibiru Bldg., 2-2, Uchisaiwaicho 1-chome, Chiyoda-ku, Tokyo 1000011, JP
Priority Data:
2009-00408509.01.2009JP
2009-01602627.01.2009JP
Title (EN) METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK FOR EXPOSURE
(FR) PROCÉDÉ DE FABRICATION D'UN SUBSTRAT DE VERRE POUR UNE ÉBAUCHE DE MASQUE, PROCÉDÉ DE FABRICATION D'UNE ÉBAUCHE DE MASQUE ET PROCÉDÉ DE FABRICATION D'UN PHOTOMASQUE POUR EXPOSITION
(JA) マスクブランク用ガラス基板の製造方法、マスクブランクの製造方法及び露光用フォトマスクの製造方法
Abstract:
(EN) Inspecting light having a wavelength of 200 nm or less is introduced into a glass substrate from one of the end surfaces of the glass substrate which is formed in a thin board shape having six surfaces, i.e., the main surfaces of the front and rear surfaces and the four end surfaces, and is to be used for a mask blank.  Fluorescence generated from an internal defect of the glass substrate is detected by means of the inspecting light, and the internal defect of the glass substrate is detected based on the detected fluorescence.  At that time, the inspecting light entering from the end surface is tilted 2.0° to 4.0° with respect to the front and rear surfaces of the glass substrate.
(FR) Une lumière d'inspection dont la longueur d'onde est inférieure ou égale à 200 nm est introduite dans un substrat de verre depuis l'une des surfaces d'extrémité du substrat de verre qui est présente sous la forme d'une carte mince présentant six surfaces, c'est-à-dire les surfaces principales avant et arrière et les quatre surfaces d'extrémité, et qui doit être utilisée pour une ébauche de masque. La fluorescence générée depuis un défaut interne du substrat de verre est détectée au moyen de la lumière d'inspection, et le défaut interne du substrat de verre est détecté sur la base de la florescence détectée. À ce moment, la lumière d'inspection entrant depuis la surface d'extrémité est inclinée de 2,0° à 4,0° par rapport aux surfaces avant et arrière du substrat de verre.
(JA)  主表面である表・裏面と4つの端面との6面を有する薄板状をなしたマスクブランク用ガラス基板の前記いずれかの端面から波長が200nm以下の波長の光である検査光を前記ガラス基板内に導入し、その検査光によってガラス基板の内部欠陥から発生される蛍光を検出し、検出した蛍光に基づきガラス基板の内部欠陥を検出する。その際に、前記端面から入射する検査光を、ガラス基板の表・裏面に対して2.0°~4.0°傾ける。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020110119689