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1. (WO2010077273) STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/077273 International Application No.: PCT/US2009/006406
Publication Date: 08.07.2010 International Filing Date: 07.12.2009
IPC:
G03F 7/09 (2006.01) ,B41C 1/10 (2006.01) ,B41N 1/08 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
C
PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
1
Forme preparation
10
for lithographic printing; Master sheets for transferring a lithographic image to the forme
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
04
metallic
08
for lithographic printing
Applicants:
EASTMAN KODAK COMPANY [US/US]; 343 State Street Rochester, New York 14650-2201, US (AllExceptUS)
RAY, Kevin, Barry [GB/US]; US (UsOnly)
MULLIGAN, James, L. [GB/US]; US (UsOnly)
BECKLEY, Scott, A. [US/US]; US (UsOnly)
Inventors:
RAY, Kevin, Barry; US
MULLIGAN, James, L.; US
BECKLEY, Scott, A.; US
Common
Representative:
EASTMAN KODAK COMPANY; 343 State Street Rochester, New York 14650-2201, US
Priority Data:
12/336,63517.12.2008US
Title (EN) STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS
(FR) EMPILEMENT D'ÉLÉMENTS IMAGEABLES FONCTIONNANT EN NÉGATIF
Abstract:
(EN) A plurality of negative-working lithographic printing plate precursors is provided in a stack. Each precursor comprises an aluminum-containing substrate having thereon a single imageable layer and an outermost topcoat that has a dry coating weight equal to or less than 1 g/m2. The non-imaging backside of the substrate is free of polymer coatings and has an average surface roughness (Ra) in both longitudinal and width directions greater than 0.15 μm. In addition, the imageable side of each underlying precursor is arranged in direct contact with the aluminum-containing substrate of the precursor above it without the use of an interleaf paper between the precursors.
(FR) Une pluralité de précurseurs pour plaque d'impression lithographique fonctionnant en négatif est disposée dans l'empilement selon l'invention. Chaque précurseur comprend un substrat contenant de l'aluminium sur lequel est disposée une seule couche imageable et un revêtement externe dont le poids de revêtement sec est inférieur ou égal à 1 g/m2. La face arrière sans image du substrat est dépourvue de revêtements polymères et présente une rugosité de surface moyenne (Ra) dans les directions de la longueur comme de la largeur supérieure à 0,15 µm. De plus, le côté imageable de chaque précurseur sous-jacent est disposé en contact direct avec le substrat contenant de l'aluminium du précurseur au-dessus de lui sans l'utilisation d'un papier intercalaire entre les précurseurs.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP2366129JP2012512074CN102257433