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1. (WO2010076909) POWER SUPPLY FOR DUAL-MODE PLASMA TORCH
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/076909 International Application No.: PCT/KR2009/000145
Publication Date: 08.07.2010 International Filing Date: 09.01.2009
IPC:
H05H 1/26 (2006.01) ,H05H 1/36 (2006.01) ,H05H 1/32 (2006.01) ,H05H 1/24 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
26
Plasma torches
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
26
Plasma torches
32
using an arc
34
Details, e.g. electrodes, nozzles
36
Circuit arrangements
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
26
Plasma torches
32
using an arc
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
Applicants:
한국수력원자력 주식회사 KOREA HYDRO & NUCLEAR POWER CO., LTD. [KR/KR]; 서울시 강남구 삼성동 167 167 Samsung-dong, Gangnam-gu Seoul 135-971, KR (AllExceptUS)
주식회사 애드플라텍 ADVANCED PLASMA TECHNOLOGY, INC. [KR/KR]; 대전시 유성구 전민동 461-38 461-38 Jeonmin-dong, Yuseong-gu Daejeon 305-811, KR (AllExceptUS)
문영표 MOON, Young Pyo [KR/KR]; KR (UsOnly)
맹성준 MAENG, Sung Jun [KR/KR]; KR (UsOnly)
황태원 HWANG, Tae Won [KR/KR]; KR (UsOnly)
신상운 SHIN, Sang Woon [KR/KR]; KR (UsOnly)
문찬국 MOON, Chan Kook [KR/KR]; KR (UsOnly)
황순모 HWANG, Soon Mo [KR/KR]; KR (UsOnly)
김영석 KIM, Young Suk [KR/KR]; KR (UsOnly)
도철진 DO, Chul Jin [KR/KR]; KR (UsOnly)
Inventors:
문영표 MOON, Young Pyo; KR
맹성준 MAENG, Sung Jun; KR
황태원 HWANG, Tae Won; KR
신상운 SHIN, Sang Woon; KR
문찬국 MOON, Chan Kook; KR
황순모 HWANG, Soon Mo; KR
김영석 KIM, Young Suk; KR
도철진 DO, Chul Jin; KR
Agent:
최규팔 CHOI, Kyu Pal; 서울시 강남구 역삼동 824-11 한라클래식빌딩 4층 Halla Classic Building 4F. 824-11 Yeoksam-dong, Kangnam-gu Seoul 135-080, KR
Priority Data:
10-2008-013798931.12.2008KR
Title (EN) POWER SUPPLY FOR DUAL-MODE PLASMA TORCH
(FR) ALIMENTATION POUR TORCHE A PLASMA DOUBLE MODE
(KO) 혼합형 플라즈마 토치의 전원 장치
Abstract:
(EN) A dual-mode plasma torch is operated by including a proper amount of non-transferred arc in a transferred arc in order to prevent unstable operation which is a problem of a known transferred plasma torch. The known power supply for a dual-mode plasma torch uses two rectifiers. However, the present invention uses one rectifier and two insulated gate bipolar transistor (IGBT) stacks to adjust the electronic currents of the transferred and non-transferred arcs in the dual-mode plasma torch. One of the two IGBT stacks determines the sum of the currents of the transferred and non-transferred arcs, and the opening time thereof varies continuously depending on the variation of electrical conductivity in an arc path. In addition, the other IGBT stack determines the current of the non-transferred arc, and the opening time thereof is constantly maintained. The above-mentioned power supply of the dual-mode plasma torch reduces equipment costs, is equipped stably, improves the heating efficiency of molten metals and extends the electrode life of the torch, in comparison with the power supply using two rectifiers.
(FR) Selon l'invention, une torche à plasma double mode est actionnée par l'introduction d'une quantité appropriée d'arc non transféré dans un arc transféré, de sorte à empêcher un fonctionnement instable problématique pour une torche à plasma transféré classique. Une alimentation classique de torche à plasma double mode met en oeuvre deux redresseurs. La présente invention met en oeuvre un seul redresseur et deux empilements de transistors bipolaires à grille isolée (IGBT) pour réguler les courants électroniques des arcs transféré et non transféré dans la torche à plasma double mode. Un des deux empilements d'IGBT détermine la somme des courants des arcs transféré et non transféré et leur temps d'ouverture varie de façon continue en fonction de la variation de conductivité électrique dans une trajectoire d'arc. De plus, l'autre empilement d'IGBT détermine le courant de l'arc non transféré et son temps d'ouverture est maintenu de façon constante. L'alimentation de torche à plasma double mode selon l'invention réduit les coûts d'équipement, est stable, améliore l'efficacité de chauffage de métaux en fusion et allonge la durée de vie des électrodes de la torche, par rapport à une alimentation à deux redresseurs.
(KO) 혼합형 플라즈마 토치는 이행형 플라즈마 토치의 문제점인 운전의 불안정성을 해결하기 위하여 이행 아크에 적당량의 비이행 아크를 포함하여 운전하는 기기이다. 종래의 혼합형 플라즈마 토치의 전원 장치는 두 개의 정류기들을 사용하고 있으나 본 발명은 하나의 정류기와 두 개의 절연게이트 양극성 트랜지스터 스택(insulated gate bipolar transistor stack)을 이용하여 혼합형 플라즈마 토치의 비이행 아크와 이행 아크의 전류량을 조절할 수 있다. 두 개의 절연게이트 양극성 트랜지스터 스택 중 하나는 비이행 아크와 이행 아크의 전류량의 합을 결정하고, 그의 개방 시간은 아크 경로 내의 전기전도도 변화에 따라 지속적으로 변한다. 한편, 다른 하나는 비이행 아크의 전류량을 결정하고, 그의 개방 시간은 일정하게 유지된다. 상기와 같은 혼합형 플라즈마 토치의 전원 장치는 두 개의 정류기를 사용하는 경우에 비해, 장치비가 절약되고, 설비가 안정적이며, 용탕의 가열 효율 및 토치의 전극 수명이 연장되는 효과를 얻을 수 있다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)