Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2010074434) HIGH VOLTAGE POWER SUPPLY USED IN PLASMA ENVIRONMENT FACILITIES AND A CONTROL METHOD THEREOF
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/074434 International Application No.: PCT/KR2009/007316
Publication Date: 01.07.2010 International Filing Date: 08.12.2009
IPC:
H02M 7/48 (2007.01)
H ELECTRICITY
02
GENERATION, CONVERSION, OR DISTRIBUTION OF ELECTRIC POWER
M
APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
7
Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
42
Conversion of dc power input into ac power output without possibility of reversal
44
by static converters
48
using discharge tubes with control electrode or semiconductor devices with control electrode
Applicants:
주식회사 포스콘 POSCON CORPORATION [KR/KR]; 경상북도 포항시 남구 호동 606번지 606, Ho-dong, Nam-gu, Pohang-si, Gyeongsangbuk-do 790-380, KR (AllExceptUS)
김수홍 KIM, Soo Hong [KR/KR]; KR (UsOnly)
이정흠 LEE, Jeong Hum [KR/KR]; KR (UsOnly)
권병기 KWON, Byong Ki [KR/KR]; KR (UsOnly)
Inventors:
김수홍 KIM, Soo Hong; KR
이정흠 LEE, Jeong Hum; KR
권병기 KWON, Byong Ki; KR
Agent:
정지원 JEONG, Ji Won; 서울시 강남구 역삼동 648-1 BYC빌딩 5층 5th Floor, BYC Bldg., 648-1 Yeoksam-dong, Gangnam-gu Seoul 135-080, KR
Priority Data:
10-2008-013494026.12.2008KR
10-2009-011726730.11.2009KR
Title (EN) HIGH VOLTAGE POWER SUPPLY USED IN PLASMA ENVIRONMENT FACILITIES AND A CONTROL METHOD THEREOF
(FR) ALIMENTATION ÉLECTRIQUE HAUTE TENSION UTILISÉE DANS DES LOCAUX À ENVIRONNEMENT PLASMIQUE ET PROCÉDÉ DE COMMANDE ASSOCIÉ
(KO) 플라즈마 환경설비에 이용되는 고압 전원 장치 및 그 제어방법
Abstract:
(EN) The present invention is directed to a high voltage power supply used in plasma environment facilities, which can easily increase an output voltage to be supplied to an output end by serial connection through modularization, and simultaneously and uniformly charge chargers in an individual high voltage power supply means. The high voltage power supply used in plasma environment facilities according to the present invention comprises 1st to N-th (N is a natural number no less than 2) high voltage power supply means, each of the 1st to N-th high voltage power supply means including: a primary rectifier for performing full-wave rectification on an AC voltage to generate a DC voltage; an inverter for converting the DC voltage into a radio-frequency square wave voltage by switching based on a switching control signal; a transformer having a primary side to receive the radio-frequency square wave voltage and a secondary side to generate a boosted, high voltage; a secondary rectifier for performing full-wave rectification on a high voltage on the secondary side of the transformer; and a charger for charging a voltage output from the secondary rectifier, and an inverter controller, which outputs 1st to N-th detected currents flowing through the 1st to N-th high voltage power supply means, 1st to N-th detected, divided voltages output from the 1st to N-th high voltage power supply means, a total output voltage of the 1st to N-th high voltage power supply means, and a reference voltage to provide a reference value of the charger being applied from outside and which receives a synchronous flag signal applied from outside and then outputs a synchronized switching control signal.
(FR) L'invention concerne une alimentation électrique haute tension utilisée dans des locaux à environnement plasmique, qui permet d'augmenter facilement la tension de sortie à fournir à une extrémité de sortie par une connexion série par modularisation, et qui permet de charger simultanément et uniformément des chargeurs dans un moyen d'alimentation électrique haute tension individuel. L'alimentation électrique haute tension utilisée dans des locaux à environnement plasmique selon l'invention comprend de 1 à N (N étant un nombre naturel au moins égal à 2) moyens d'alimentation électrique haute tension qui comprennent chacun : un redresseur primaire pour effectuer un redressement d'onde pleine d'une tension CA afin de générer une tension CC; un onduleur pour convertir la tension CC en une tension d'onde carrée radiofréquence par commutation en fonction d'un signal de commande de commutation; un transformateur comprenant un côté primaire afin de recevoir la tension d'onde carrée radiofréquence et un côté secondaire pour générer une haute tension amplifiée; un second redresseur pour effectuer un redressement d'onde pleine de la haute tension du côté secondaire du transformateur; et un chargeur pour charger une sortie de tension provenant du redresseur secondaire, et une unité de commande d'onduleur qui émet 1 à N courants détectés circulant à travers les 1 à N moyens d'alimentation haute tension, 1 à N tensions divisées détectées émises des 1 à N moyens d'alimentation haute tension, une tension de sortie totale des 1 à N moyens d'alimentation haute tension, et une tension de référence afin de fournir une valeur de référence du chargeur étant appliquée de l'extérieur, et qui reçoit un signal drapeau synchrone appliqué de l'extérieur et émet un signal de commande de commutation synchronisé.
(KO) 본 발명이 해결하고자 하는 과제는 플라즈마 환경설비에 이용되는 고압 전원 장치를 제공하는 것으로서, 모듈화하여 직렬로 연결함으로써 출력단에 제공하는 출력 전압을 용이하게 증가시킬 수 있고, 개별 고압 전원 수단 내 충전부가 동시에 충전될 수 있고, 균형적으로 충전될 수 있는 고압 전원 장치 및 그 제어방법을 제공한다. 본원 발명에 따른 플라즈마 환경설비에 이용되는 고압 전원 장치는, 플라스마 환경설비에 이용되는 고압 전원 장치에 있어서, 상기 고압 전원 장치는 제1 내지 제N(여기서, N은 2 이상의 자연수) 고압 전원 수단을 포함하고, 상기 제1 내지 제N 고압 전원 수단 각각은, 교류 전압을 전파 정류하여 직류 전압을 생성하는 1차 정류부; 스위칭 제어신호에 기초한 스위칭에 의해 상기 직류 전압을 고주파의 구형파 전압으로 변환하는 인버터; 상기 고주파의 구형파 전압을 1차측에서 입력받고, 2차측에서 승압된 고전압을 생성하는 변압부; 상기 변압부의 2차측 고전압을 전파 정류하는 2차 정류부; 및 상기 2차 정류부에서 출력되는 전압을 충전하는 충전부를 포함하고, 상기 제1 내지 제N 고압 충전부의 충전부는 직렬연결되며, 상기 제1 내지 제N 고압 전원 수단에 흐르는 제1 내지 제N 검출전류, 상기 제1 내지 제N 고압 전원 수단으로부터 출력되는 제1 내지 제N 검출분압전압, 상기 제1 내지 제N 고압 전원 수단의 전체 출력전압, 외부에서 인가되는 상기 충전부의 기준치를 제공하기 위한 기준전압, 및 외부에서 인가되는 동기 플래그 신호를 입력받아 동기된 상기 스위칭 제어신호를 출력하는 인버터 제어부를 포함한다.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)