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1. (WO2010074301) CHLOROSILANE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/074301 International Application No.: PCT/JP2009/071835
Publication Date: 01.07.2010 International Filing Date: 22.12.2009
IPC:
C01B 33/107 (2006.01) ,B01J 31/08 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
33
Silicon; Compounds thereof
08
Compounds containing halogen
107
Halogenated silanes
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
31
Catalysts comprising hydrides, coordination complexes or organic compounds
02
containing organic compounds or metal hydrides
06
containing polymers
08
Ion-exchange resins
Applicants:
株式会社トクヤマ TOKUYAMA CORPORATION [JP/JP]; 山口県周南市御影町1番1号 1-1, Mikage-cho, Shunan-shi, Yamaguchi 7450053, JP (AllExceptUS)
飯山 昭二 IIYAMA, Shouji [JP/JP]; JP (UsOnly)
山本 朋浩 YAMAMOTO, Tomohiro [JP/JP]; JP (UsOnly)
高田 幸宏 TAKATA, Yukihiro [JP/JP]; JP (UsOnly)
小柳 信一郎 KOYANAGI, Shinichirou [JP/JP]; JP (UsOnly)
坂田 勘治 SAKATA, Kanji [JP/JP]; JP (UsOnly)
Inventors:
飯山 昭二 IIYAMA, Shouji; JP
山本 朋浩 YAMAMOTO, Tomohiro; JP
高田 幸宏 TAKATA, Yukihiro; JP
小柳 信一郎 KOYANAGI, Shinichirou; JP
坂田 勘治 SAKATA, Kanji; JP
Agent:
大島 正孝 OHSHIMA, Masataka; 東京都新宿区新宿1丁目17番11号BN御苑ビル 大島特許事務所 OHSHIMA PATENT OFFICE, BN Gyoen Building, 17-11, Shinjuku 1-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2008-33026925.12.2008JP
Title (EN) CHLOROSILANE MANUFACTURING METHOD
(FR) PROCÉDÉ DE FABRICATION D'UN CHLOROSILANE
(JA) クロロシランの製造方法
Abstract:
(EN) The method is for manufacturing disproportionated chlorosilane by means of a reaction by causing liquid, as the starting material, to flow through catalyst-packed layer which is packed with a weakly basic anion-exchange resin disproportionation reaction catalyst. Prior to the disproportionation reaction, the disproportionation reaction catalyst is brought into contact with a processing gas wherein is diluted with an inert gas, deterioration of the ionation reaction catalyst at the time the reaction starts is prevented, and efficient disproportionation of the chlorosilane is achieved.
(FR) L'invention porte sur un procédé de fabrication d'un chlorosilane ayant subi une dismutation au moyen d'une réaction en amenant un liquide, en tant que matière de départ, à circuler à travers une couche garnie de catalyseur qui est garnie d'un catalyseur de réaction de dismutation de résine échangeuse d'anions faiblement basiques. Avant la réaction de dismutation, le catalyseur de réaction de dismutation est amené en contact avec un gaz de traitement dans lequel est dilué un gaz inerte, la détérioration du catalyseur de réaction de dismutation au moment où la réaction démarre ne pouvant ainsi se produire, et une dismutation efficace du chlorosilane est obtenue.
(JA) 弱塩基性陰イオン交換樹脂の不均化反応触媒が充填された触媒充填層に原料クロロシラン液体を流通させて不均化反応を行ない、不均化されたクロロシランを製造するに際し、不均化反応を行う前に、前記不均化反応触媒に、クロロシランを不活性ガスで希釈した処理ガスと予め接触させて反応開始時における前記不均化反応触媒の劣化を防止し、効率良くクロロシランの不均化を行う方法。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
EP2371765US20110236289CN102264642RU2011130894KR1020110117054MYPI 2011002532