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1. (WO2010074250) SPUTTERING APPARATUS AND METHOD OF PRODUCING MAGNETIC STORAGE MEDIUM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/074250 International Application No.: PCT/JP2009/071645
Publication Date: 01.07.2010 International Filing Date: 25.12.2009
Chapter 2 Demand Filed: 26.10.2010
IPC:
G11B 5/851 (2006.01) ,C23C 14/34 (2006.01)
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
851
Coating a support with a magnetic layer by sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
Applicants:
キヤノンアネルバ株式会社 CANON ANELVA CORPORATION [JP/JP]; 神奈川県川崎市麻生区栗木2-5-1 2-5-1 Kurigi, Asao-ku, Kawasaki-shi, Kanagawa 2158550, JP (AllExceptUS)
鳥井 宏 TORII Hiroshi [JP/JP]; JP (UsOnly)
徐 舸 XU Ge [CN/JP]; JP (UsOnly)
Inventors:
鳥井 宏 TORII Hiroshi; JP
徐 舸 XU Ge; JP
Agent:
岡部 正夫 OKABE Masao; 東京都千代田区丸の内3-2-3 富士ビル602号室 No. 602, Fuji Bldg. , 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1000005, JP
Priority Data:
2008-33409526.12.2008JP
Title (EN) SPUTTERING APPARATUS AND METHOD OF PRODUCING MAGNETIC STORAGE MEDIUM
(FR) APPAREIL DE PULVÉRISATION ET PROCÉDÉ DE PRODUCTION DE SUPPORT DE STOCKAGE MAGNÉTIQUE
(JA) スパッタ装置及び磁気記憶媒体の製造方法
Abstract:
(EN) A sputtering apparatus enabling formation of an embedded layer with higher production efficiency when producing a magnetic recording medium; and a method of producing such a magnetic storage medium. In this apparatus, cathodes are arranged facing each other across a substrate (201), and the high frequency power applied to each cathode is made the same phase. At this time, the distance between each cathode and the substrate (201) is preferably made short. Further, it is also preferable to form the embedded layer while attracting cations in the plasma to the substrate (201) by an attracting electric field.
(FR) L'invention concerne un appareil de pulvérisation permettant de former une couche incorporée avec une efficacité de production plus grande lors de la production d'un support d'enregistrement magnétique; et un appareil permettant de produire un tel support de stockage magnétique. Dans cet appareil, les cathodes sont disposées l'une face à l'autre sur un substrat (201), et la puissance haute fréquence appliquée à chaque cathode a la même phase. A ce moment, la distance entre chaque cathode et le substrat (201) est de préférence réduite. De plus, il est également préférable de former la couche incorporée en attirant les cations contenus dans le plasma vers le substrat (201) par un champ électrique attractif.
(JA) 本発明は、磁気記録媒体の製造において、より生産効率の高い埋め込み層の形成が可能なスパッタ装置及び磁気記憶媒体の製造方法を提供する。本発明の一実施形態では、基板(201)を挟んで対向するカソードを配置し、各カソードへ印加する高周波電力を同位相とする。このとき、各カソードと基板(201)との間の距離を小さくすることが好ましい。更に、引き込み電界によりプラズマ中の正イオンを基板(201)に引き込みながら埋め込み層の成膜を行うも好ましい。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)