Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2010073794) ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/073794 International Application No.: PCT/JP2009/067339
Publication Date: 01.07.2010 International Filing Date: 05.10.2009
IPC:
H01L 21/027 (2006.01) ,G02B 19/00 (2006.01) ,G03F 7/20 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
19
Condensers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
株式会社 ニコン NIKON CORPORATION [JP/JP]; 東京都千代田区有楽町一丁目12番1号 12-1, Yurakucho 1-Chome, Chiyoda-ku, Tokyo 1008331, JP (AllExceptUS)
田中 裕久 TANAKA, Hirohisa [JP/JP]; JP (UsOnly)
廣田 弘之 HIROTA, Hiroyuki [JP/JP]; JP (UsOnly)
Inventors:
田中 裕久 TANAKA, Hirohisa; JP
廣田 弘之 HIROTA, Hiroyuki; JP
Agent:
恩田 博宣 ONDA, Hironori; 岐阜県岐阜市大宮町2丁目12番地の1 12-1, Ohmiya-cho 2-chome, Gifu-shi, Gifu 5008731, JP
Priority Data:
2008-33151025.12.2008JP
61/193,80124.12.2008US
Title (EN) ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
(FR) SYSTÈME OPTIQUE D'ÉCLAIRAGE, APPAREIL D'EXPOSITION ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
(JA) 照明光学系、露光装置及びデバイスの製造方法
Abstract:
(EN) An illumination optical system (13) includes: an optical integrator (26) which forms a secondary light source in an illumination pupil plane (27) in the illumination optical path of the illumination optical system (13) when an exposure light (EL) from a light source device (12) is incident; a first transmission filter (66) which is arranged in the optical path of the exposure light (EL) emitted from a third planar light source of the secondary light source and has transmission factor characteristics changing in accordance with the incident angle of the exposure light (EL); a second transmission filter (67) which is arranged in the optical path of the exposure light (EL) emitted from a fourth planar light source of the secondary light source and has transmission factor characteristics changing in accordance with the incident angle of the exposure light (EL); and a rotation mechanism (68) which rotates the first and the second transmission filter (66, 67) so as to change the inclination angle with respect to the optical axis AX of the illumination optical system (13).
(FR) L'invention concerne un système optique d'éclairage (13) comprenant un intégrateur optique (26) formant une source de lumière secondaire dans un plan de pupille d'éclairage (27) dans le trajet optique d'éclairage du système optique d'éclairage (13) quand une lumière d'exposition (EL) provenant d'une source de lumière d'un dispositif (12) est incidente ; un premier filtre à transmission (66) qui est placé sur le trajet optique de la lumière d'exposition (EL) émise par une troisième source de lumière planaire de la source de lumière secondaire et qui possède des caractéristiques de facteur de transmission changeant en fonction de l'angle d'incidence de la lumière d'exposition (EL) ; un second filtre à transmission (67) qui est placé sur le trajet optique de la lumière d'exposition (EL) émises par une quatrième source de lumière planaire de la source de lumière secondaire et qui possède des caractéristiques de facteur de transmission changeant en fonction de l'angle d'incidence de la lumière d'exposition (EL) ; et un mécanisme de rotation (68) qui fait tourner le premier et le second filtre à transmission (66, 67) pour modifier l'angle d'inclinaison par rapport à l'axe optique AX du système optique d'éclairage (13).
(JA) 照明光学系(13)は、光源装置(12)からの露光光(EL)が入射した場合に照明光学系(13)の照明光路内の照明瞳面(27)に二次光源を形成するオプティカルインテグレータ(26)と、二次光源の第3面光源から射出される露光光(EL)の光路内に配置され、該露光光(EL)の入射角に応じて変化する透過率特性を有する第1の透過フィルタ(66)と、二次光源の第4面光源から射出される露光光(EL)の光路内に配置され、該露光光(EL)の入射角に応じて変化する透過率特性を有する第2の透過フィルタ(67)と、照明光学系(13)の光軸AXに対する傾斜角度が変化するように第1及び第2の透過フィルタ(66,67)を回転させる回転機構(68)と、を備えている。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
JPWO2010073794