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1. (WO2010073666) GAS SUPPLYING APPARATUS, VACUUM PROCESSING APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/073666 International Application No.: PCT/JP2009/007188
Publication Date: 01.07.2010 International Filing Date: 24.12.2009
IPC:
C23C 14/54 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
54
Controlling or regulating the coating process
Applicants:
キヤノンアネルバ株式会社 CANON ANELVA CORPORATION [JP/JP]; 神奈川県川崎市麻生区栗木2丁目5番1号 5-1, Kurigi 2-chome, Asao-ku, Kawasaki-shi, Kanagawa 2158550, JP (AllExceptUS)
松村康晴 MATSUMURA, Yasuharu [JP/JP]; JP (UsOnly)
森脇崇行 MORIWAKI, Takayuki [JP/JP]; JP (UsOnly)
Inventors:
松村康晴 MATSUMURA, Yasuharu; JP
森脇崇行 MORIWAKI, Takayuki; JP
Agent:
渡辺敬介 WATANABE, Keisuke; 東京都台東区台東四丁目11番4号三井住友銀行御徒町ビル6階 6th Floor, Mitsui Sumitomo Ginko Okachimachi Bldg., 11-4, Taito 4-chome, Taito-ku, Tokyo 1100016, JP
Priority Data:
2008-33285626.12.2008JP
Title (EN) GAS SUPPLYING APPARATUS, VACUUM PROCESSING APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
(FR) DISPOSITIF DE DISTRIBUTION DE GAZ, DISPOSITIF DE TRAITEMENT SOUS VIDE ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE
(JA) ガス供給装置、真空処理装置及び電子デバイスの製造方法
Abstract:
(EN) Provided is a gas supplying apparatus (20) which can uniformly supply a gas and can ensure uniform film qualities even when the total length of a gas supplying pipe (21) is long.  The gas supplying apparatus (20) is provided with the gas supplying pipe (21) which is configured using a double pipe composed of an inner pipe (23) connected to a gas introducing pipe (22) and an outer pipe (24) covering the outer circumferential section of the inner pipe (23) with a space therebetween.  The inner pipe (23) has, at least on a part of the pipe, a porous sintered body (25) which passes through the gas, and the outer pipe (24) has a multitude of gas blowout ports (26) from which the gas passed through the sintered body (25) is discharged into a vacuum container.
(FR) L'invention concerne un dispositif de distribution de gaz (20) qui est capable de distribuer un gaz de façon uniforme et qui peut assurer des qualités de film uniformes même lorsque la longueur totale du tuyau de distribution de gaz (21) est longue. Le dispositif de distribution de gaz (20) comprend un tuyau de distribution de gaz (21) qui est configuré en utilisant un double tuyau composé d'un tuyau intérieur (23) qui est connecté à un tuyau d'introduction de gaz (22), et d'un tuyau extérieur (24) qui couvre la section circonférentielle du tuyau intérieur (23) en laissant un espace entre ceux-ci. Le tuyau intérieur (23) comporte, au moins sur une partie du tuyau, un corps fritté poreux (25) qui passe à travers le gaz, et le tuyau extérieur (24) comprend une multitude de ports d'expulsion de gaz (26) à partir desquels le gaz qui est passé à travers le corps fritté (25) est déchargé dans un récipient sous vide.
(JA)  ガス供給管21の全長が長くとも、均一にガスを供給することができ、膜質の均一性を確保することができるガス供給装置20を提供する。 ガス導入管22に接続された内管23と、該内管23の外周部を間隙を隔てて被う外管24とからなる二重管で構成されたガス供給管21を備え、前記内管23は、少なくとも一部にガスを通過させる多孔質の焼結体25を有し、前記外管24は、前記焼結体25を通過したガスを真空容器内へ放出させる多数のガス吹出口26を有するガス供給装置20とする。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
JPWO2010073666US20110064877