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1. (WO2010073626) METHOD AND DEVICE FOR TREATING FILM SURFACE AND PROCESS FOR PRODUCING POLARIZER
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/073626 International Application No.: PCT/JP2009/007128
Publication Date: 01.07.2010 International Filing Date: 22.12.2009
IPC:
C08J 7/18 (2006.01) ,B32B 27/16 (2006.01) ,G02B 5/30 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
7
Chemical treatment or coating of shaped articles made of macromolecular substances
12
Chemical modification
16
with polymerisable compounds
18
using wave energy or particle radiation
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
16
specially treated, e.g. irradiated
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
30
Polarising elements
Applicants:
積水化学工業株式会社 SEKISUI CHEMICAL CO., LTD. [JP/JP]; 大阪府大阪市北区西天満2丁目4番4号 4-4, Nishitemma 2-chome, Kita-ku, Osaka-shi, Osaka 5308565, JP (AllExceptUS)
屋良卓也 YARA, Takuya [JP/JP]; JP (UsOnly)
松崎純一 MATSUZAKI, Junichi [JP/JP]; JP (UsOnly)
川崎真一 KAWASAKI, Shinichi [JP/JP]; JP (UsOnly)
山本真矢 YAMAMOTO, Shinya [JP/JP]; JP (UsOnly)
野上光秀 NOGAMI, Mitsuhide [JP/JP]; JP (UsOnly)
中野良憲 NAKANO, Yoshinori [JP/JP]; JP (UsOnly)
長谷川平 HASEGAWA, Taira [JP/JP]; JP (UsOnly)
Inventors:
屋良卓也 YARA, Takuya; JP
松崎純一 MATSUZAKI, Junichi; JP
川崎真一 KAWASAKI, Shinichi; JP
山本真矢 YAMAMOTO, Shinya; JP
野上光秀 NOGAMI, Mitsuhide; JP
中野良憲 NAKANO, Yoshinori; JP
長谷川平 HASEGAWA, Taira; JP
Agent:
渡辺昇 WATANABE, Noboru; 東京都千代田区九段南3丁目7番7号、九段南グリーンビル3階 Kudanminami Green Bldg. 3F., 7-7, Kudanminami 3-chome, Chiyoda-ku, Tokyo 1020074, JP
Priority Data:
2008-32959225.12.2008JP
Title (EN) METHOD AND DEVICE FOR TREATING FILM SURFACE AND PROCESS FOR PRODUCING POLARIZER
(FR) PROCÉDÉ ET DISPOSITIF PERMETTANT DE TRAITER UNE SURFACE DE FILM ET PROCÉDÉ DE PRODUCTION D'UN POLARISEUR
(JA) フィルムの表面処理方法及び装置並びに偏光板の製造方法
Abstract:
(EN) A difficult-to-bond resin film (11) to be bonded to an easily bondable resin film (12) is disposed in a treatment space (22) having a pressure around atmospheric pressure.  A process gas containing the vapor of acrylic acid (polymerizable monomer) is supplied to the treatment space (22) with a process gas supply system (3).  In a plasma treatment part (2), the process gas is converted to a plasma and brought into contact with the difficult-to-bond resin film (11).  The flow rate of the process gas to be supplied is set so that the treatment space (22) has an oxygen concentration of 3,000 ppm or lower.  This configuration improves the bondability of the difficult-to-bond resin film and renders high-speed treatment possible.
(FR) L'invention concerne un film de résine difficile à lier (11) destiné à se lier à un film de résine pouvant facilement se lier (12) qui est placé dans un espace de traitement (22) ayant une pression autour de la pression atmosphérique. Un gaz de procédé contenant la vapeur d'acide acrylique (monomère polymérisable) est alimenté vers l'espace de traitement (22) avec un système d'alimentation du gaz de procédé (3). Dans une partie de traitement par plasma (2), le gaz de procédé est converti en plasma et est mis au contact du film de résine difficile à lier (11). Le débit du gaz de procédé à alimenter est fixé de sorte que l'espace de traitement (22) possède une concentration d'oxygène de 3000 ppm ou moins. Cette configuration améliore la capacité de liaison du film de résine difficile à lier et rend possible un traitement à grande vitesse.
(JA)  易接着性樹脂フィルム12と接着されるべき難接着性樹脂フィルム11を大気圧近傍の処理空間22に配置する。プロセスガス供給系3によってアクリル酸(重合性モノマー)の蒸気を含有するプロセスガスを処理空間22に供給する。プラズマ処理部2においてプロセスガスをプラズマ化し難接着性樹脂フィルム11に接触させる。プロセスガスプロセスガスの供給流量を、処理空間22内の酸素濃度が3000ppm以下になるよう設定する。これにより、難接着性樹脂フィルムの接着性を向上させ、更には高速処理を可能にする。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
JPWO2010073626CN102257045KR1020110098847