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1. (WO2010073430) METHOD FOR PRODUCING CONCENTRATED SOLUTION FOR PHOTORESIST STRIPPER HAVING LOW WATER CONTENT
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/073430 International Application No.: PCT/JP2009/004169
Publication Date: 01.07.2010 International Filing Date: 27.08.2009
IPC:
C07C 209/90 (2006.01) ,C07C 211/63 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
209
Preparation of compounds containing amino groups bound to a carbon skeleton
82
Purification; Separation; Stabilisation; Use of additives
90
Stabilisation; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
211
Compounds containing amino groups bound to a carbon skeleton
62
Quaternary ammonium compounds
63
having quaternised nitrogen atoms bound to acyclic carbon atoms
Applicants:
神戸天然物化学株式会社 KNC LABORATORIES CO., LTD. [JP/JP]; 兵庫県神戸市西区高塚台3丁目2番地の34 2-34, Takatsukadai 3-chome, Nishi-ku, Kobe-shi, Hyogo 6512271, JP (AllExceptUS)
株式会社ビジョンリンク VISION LINK CORP. [JP/JP]; 東京都町田市南成瀬7-4-15 7-4-15, Minaminaruse, Machida-shi, Tokyo 1940045, JP (AllExceptUS)
広瀬 克利 HIROSE, Katsutoshi [JP/JP]; JP (UsOnly)
古山 浩也 KOYAMA, Hiroya [JP/JP]; JP (UsOnly)
釜坂 公浩 KAMASAKA, Kimihiro [JP/JP]; JP (UsOnly)
雀部 太郎 SASABE, Taro [JP/JP]; JP (UsOnly)
賀井 尚志 KAI, Naoshi [JP/JP]; JP (UsOnly)
Inventors:
広瀬 克利 HIROSE, Katsutoshi; JP
古山 浩也 KOYAMA, Hiroya; JP
釜坂 公浩 KAMASAKA, Kimihiro; JP
雀部 太郎 SASABE, Taro; JP
賀井 尚志 KAI, Naoshi; JP
Agent:
風早 信昭 KAZAHAYA, Nobuaki; 大阪府大阪市西区土佐堀1丁目6番20号新栄ビル 6階 Shin-Ei Building 6th Fl., 6-20, Tosabori 1-chome, Nishi-ku, Osaka-shi, Osaka 5500001, JP
Priority Data:
2008-33208426.12.2008JP
Title (EN) METHOD FOR PRODUCING CONCENTRATED SOLUTION FOR PHOTORESIST STRIPPER HAVING LOW WATER CONTENT
(FR) PROCÉDÉ DE PRODUCTION DE SOLUTION CONCENTRÉE POUR AGENT DE DÉCAPAGE DE RÉSINE PHOTOSENSIBLE AYANT UNE FAIBLE TENEUR EN EAU
(JA) 低含水量のフォトレジスト剥離液用濃縮液の製造方法
Abstract:
(EN) Disclosed is a method for producing a concentrated solution of quaternary ammonium hydroxide.  The method is characterized by comprising: mixing quaternary ammonium hydroxide in the form of a water-containing crystal or an aqueous solution with a water-soluble organic solvent selected from the group consisting of a glycol ether, a glycol and a triol to prepare a mixed solution; and subjecting the mixed solution to thin-film distillation under reduced pressure to distil a distillate away.  By employing the method, it becomes possible to produce a concentrated quaternary ammonium hydroxide solution having a low water content conveniently.
(FR) L'invention porte sur un procédé de production d'une solution concentrée d'hydroxyde d'ammonium quaternaire. Le procédé est caractérisé en ce qu'il comprend : le mélange d'hydroxyde d'ammonium quaternaire sous la forme de cristaux contenant de l'eau ou d'une solution aqueuse avec un solvant organique hydrosoluble choisi dans le groupe constitué par un éther de glycol, un glycol et un triol pour préparer une solution mélangée ; et l'opération consistant à soumettre la solution mélangée à une distillation en couche mince sous pression réduite pour enlever par distillation un distillat. Grâce au procédé, il devient possible de produire de manière commode une solution concentrée d'hydroxyde d'ammonium quaternaire ayant une faible teneur en eau.
(JA)  水酸化第4級アンモニウムの濃縮液の製造方法であって、含水結晶又は水溶液の形態の水酸化第4級アンモニウムと、グリコールエーテル類、グリコール類、及びトリオール類からなる群から選択される水溶性有機溶剤とを混合して混合液を調製し、その混合液を減圧下に薄膜蒸留して留出物を留去することを特徴とする製造方法が提供される。この方法によれば、低含水量の水酸化第4級アンモニウム濃縮液を簡単に製造することができる。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
EP2371809US20100298605JP4673935JPWO2010073430CN101910109KR1020110016854