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1. (WO2010073207) RF SPUTTERING ARRANGEMENT
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/073207 International Application No.: PCT/IB2009/055870
Publication Date: 01.07.2010 International Filing Date: 21.12.2009
IPC:
H01J 37/34 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
34
operating with cathodic sputtering
Applicants:
OC OERLIKON BALZERS AG [LI/LI]; Iramali 18 CH-9496 Balzers, LI (AllExceptUS)
WEICHART, Jürgen [DE/LI]; LI (UsOnly)
FELZER, Heinz [DE/CH]; CH (UsOnly)
Inventors:
WEICHART, Jürgen; LI
FELZER, Heinz; CH
Agent:
MOORE, Joanne; Schweiger & Partner Karlstr. 35 80333 München, DE
Priority Data:
61/140,10223.12.2008US
Title (EN) RF SPUTTERING ARRANGEMENT
(FR) ARRANGEMENT POUR PULVÉRISATION CATHODIQUE RF
Abstract:
(EN) Apparatus for sputtering comprises a vacuum chamber, at least one first electrode having a first surface arranged in the vacuum chamber, a counter electrode having a surface arranged in the vacuum chamber and a RF generator. The RF generator is configured to apply a RF electric field across the at least one first electrode and the counter electrode so as to ignite a plasma between the first electrode and the counter electrode. The counter electrode comprises at least two cavities in communication with the vacuum chamber, the cavities each have dimensions such that a plasma can be formed in the cavity.
(FR) L'invention concerne un appareil pour effectuer une pulvérisation cathodique comprenant une chambre à vide, au moins une première électrode possédant une première surface placée dans la chambre à vide, une contre-électrode possédant une surface placée dans la chambre à vide et un générateur RF. Le générateur RF est conçu pour appliquer un champ électrique RF entre la ou les premières électrodes et la contre-électrode pour générer un plasma entre la première électrode et la contre-électrode. La contre-électrode comprend au moins deux cavités en communication avec la chambre à vide, les cavités possédant chacune des dimensions permettant la formation d'un plasma dans la cavité.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP2382648JP2012513537CN102265375KR1020110106857