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1. (WO2010072861) PROCEDURE FOR MANUFACTURING NANOCHANNELS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2010/072861 International Application No.: PCT/ES2009/000587
Publication Date: 01.07.2010 International Filing Date: 21.12.2009
IPC:
H01L 21/02 (2006.01) ,C25D 1/10 (2006.01) ,G03F 7/20 (2006.01) ,B29C 33/56 (2006.01) ,B29C 33/60 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
1
Electroforming
10
Moulds; Masks; Masterforms
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33
Moulds or cores; Details thereof or accessories therefor
56
Coatings; Releasing, lubricating or separating agents
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33
Moulds or cores; Details thereof or accessories therefor
56
Coatings; Releasing, lubricating or separating agents
60
Releasing, lubricating or separating agents
Applicants:
UNIVERSIDAD DE BARCELONA [ES/ES]; Centro de Patentes de la UB Baldiri Reixac, 4 E-08028 Barcelona, ES (AllExceptUS)
GARCIA GÜELL, Aleix [ES/ES]; ES (UsOnly)
SANZ CARRASCO, Fausto [ES/ES]; ES (UsOnly)
Inventors:
GARCIA GÜELL, Aleix; ES
SANZ CARRASCO, Fausto; ES
Agent:
SEGURA CÁMARA, Pascual; Centro de Patentes de la UB Baldiri Reixac, 4 E-08028 Barcelona, ES
Priority Data:
P20090000722.12.2008ES
Title (EN) PROCEDURE FOR MANUFACTURING NANOCHANNELS
(ES) PROCEDIMIENTO DE FABRICACIÓN DE NANOCANALES
(FR) PROCÉDÉ DE FABRICATION DE NANOCANAUX
Abstract:
(EN) It comprises the following steps: (i) Depositing on glass a nickel electrode layer; (ii) depositing a layer of photosensitive material (photoresist) on the electrode layer; (iii) conferring a pattern on the photoresist having photolithographic form, covering it with a pattern mask and exposing it to light; (iv) lifting off the exposed portion of the nickel layer, forming in this manner a pattern of grooves; (v) filling such grooves with palladium by electrodeposition; (vi) removing the residual layer of photoresist and the residual layer of nickel, obtaining in this manner a master having a projecting pattern; (vii) transferring the pattern of the master to polydimethylsiloxane to obtain a moulded part; (viii) separating the moulded part and (ix) joining it to the planar covering part to cover the empty grooves. It is useful for manufacturing nanochannels having complicated and well-defined patterns of independently-controlled width and height.
(ES) Comprende los siguientes pasos: (i) Depositar sobre vidrio una capa de electrodo de níquel; (ii) depositar una capa de material fotosensible (photoresist) sobre la capa de electrodo; (iii) conferir un patrón al photoresist de forma fotolitográfica, cubriéndolo con una máscara de patrón y exponiéndolo a la luz; (iv) arrancar la porción expuesta de la capa de níquel, formando así un patrón de zanjas; (v) llenar las zanjas con paladio por electrodeposición; (vi) quitar la capa residual de photoresist y la capa residual de níquel, obteniendo así un a máster con patrón saliente; (vii) transferir el patrón del máster a poli(dimetilsiloxano) para obtener una parte moldeada; (viii) separar la parte moldeada, y (ix) unirla a la parte cubridora plana para tapar las zanjas vacías. Es útil para fabricar nanocanales de patrones complejos y bien definidos, y de anchura y altura controladas independientemente.
(FR) La présente invention concerne un procédé de fabrication de nanocanaux qui comprend les étapes consistant à: (i) Déposer sur du verre une couche d'électrode de nickel; (ii) déposer une couche de matériau photosensible (photorésine) sur la couche d'électrode; (iii) former un motif ayant une forme photolithographique sur la photorésine, en la recouvrant d'un masque à motif et en l'exposant à la lumière; (iv) retirer la partie exposée de la couche de nickel, ceci formant un motif de rainures; (v) remplir les rainures de palladium par dépôt électrolytique; (vi) enlever la couche résiduelle de photorésine et la couche résiduelle de nickel, ce qui produit ainsi un original comprenant le motif en relief; (vii) transférer le motif de l'original sur du poly(diméthylsiloxane) pour obtenir une partie moulée; (viii) séparer la partie moulée, et (ix) la relier à la partie couvrante plane pour couvrir les rainures vides. Ce procédé est utile pour fabriquer des nanocanaux ayant des motifs complexes et bien définis, ayant une largeur et une hauteur contrôlées de manière indépendante.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Spanish (ES)
Filing Language: Spanish (ES)