Processing

Please wait...

Settings

Settings

Goto Application

1. WO2010058281 - METHOD AND APPARATUS FOR PRODUCING THIN FILMS ON A SUBSTRATE VIA A PULSED- ELECTRON DEPOSITION PROCESS

Publication Number WO/2010/058281
Publication Date 27.05.2010
International Application No. PCT/IB2009/007528
International Filing Date 20.11.2009
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
H01J 37/304 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
304Controlling tubes by information coming from the objects, e.g. correction signals
H01J 37/317 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
CPC
C23C 14/3457
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3457using other particles than noble gas ions
H01J 37/304
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
304Controlling tubes by information coming from the objects ; or from the beam; , e.g. correction signals
H01J 37/3053
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
305for casting, melting, evaporating or etching
3053for evaporating or etching
Applicants
  • CONSIGLIO NAZIONALE DELLE RICERCHE [IT]/[IT] (AllExceptUS)
  • RAMPINO, Stefano [IT]/[IT] (UsOnly)
  • GILIOLI, Edmondo [IT]/[IT] (UsOnly)
  • BISSOLI, Francesco [IT]/[IT] (UsOnly)
  • PATTINI, Francesco [IT]/[IT] (UsOnly)
  • MAZZER, Massimo [IT]/[IT] (UsOnly)
  • FERRARI, Claudio [IT]/[IT] (UsOnly)
Inventors
  • RAMPINO, Stefano
  • GILIOLI, Edmondo
  • BISSOLI, Francesco
  • PATTINI, Francesco
  • MAZZER, Massimo
  • FERRARI, Claudio
Agents
  • JORIO, Paolo
Priority Data
MI2008A00209021.11.2008IT
Publication Language English (EN)
Filing Language Italian (IT)
Designated States
Title
(EN) METHOD AND APPARATUS FOR PRODUCING THIN FILMS ON A SUBSTRATE VIA A PULSED- ELECTRON DEPOSITION PROCESS
(FR) PROCÉDÉ ET APPAREIL POUR PRODUIRE DES FILMS MINCES SUR UN SUBSTRAT À L'AIDE D'UN PROCÉDÉ DE DÉPÔT À ÉLECTRONS PULSÉS
Abstract
(EN)
A method for producing thin films on a substrate via a pulsed- electron deposition process comprises sending a pulsed- electron beam (3) onto a target material (5), set in the proximity of a substrate (7), in such a way as to cause ablation of the target material and emission from the target material of vapour phase particles that deposit on the substrate to form a layer (8) or film; the discharge current of the beam (3) is measured for controlling the parameters of the deposition process and optimizing, in particular, the rate of growth of the layer (8). The measurement of the discharge current is based upon the use of an induction coil (27), which does not affect the primary circuit (15) for beam discharge; in particular, a coil (27) is used wound according to a particular geometry, referred to as "Rogowski coil".
(FR)
L'invention porte sur un procédé pour produire des films minces sur un substrat à l'aide d'un procédé de dépôt à électrons pulsés, lequel procédé comprend l'envoi d'un faisceau d'électrons pulsés (3) sur un matériau cible (5), disposé à proximité d'un substrat (7), de façon à provoquer une ablation du matériau cible et une émission, à partir du matériau cible, de particules en phase vapeur, qui se déposent sur le substrat de façon à former une couche (8) ou un film; le courant de décharge du faisceau (3) est mesuré pour régler les paramètres du processus de dépôt, et optimiser, en particulier, le taux de croissance de la couche (8). La mesure du courant de décharge est basée sur l'utilisation d'une bobine d'induction (27), qui n'affecte pas le circuit primaire (15) pour la décharge de faisceau. En particulier, il est utilisé une bobine (27) enroulée selon une géométrie particulière, désignée sous le nom de « bobine de Rogowski ».
Latest bibliographic data on file with the International Bureau