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1. (WO2010033170) GRAFT FABRIC CRIMPING PATTERN
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/033170    International Application No.:    PCT/US2009/005133
Publication Date: 25.03.2010 International Filing Date: 15.09.2009
IPC:
A61F 2/06 (2006.01), A61F 2/82 (2006.01)
Applicants: MED INSTITUTE, INC. [US/US]; 1 Geddes Way West Lafayette, IN 47906 (US) (For All Designated States Except US).
ROEDER, Blayne, A. [US/US]; (US) (For US Only)
Inventors: ROEDER, Blayne, A.; (US)
Agent: GODLEWSKI, Richard, J.; (US)
Priority Data:
61/097,637 17.09.2008 US
Title (EN) GRAFT FABRIC CRIMPING PATTERN
(FR) MOTIF DE TEXTURATION DE TISSU POUR GREFFE
Abstract: front page image
(EN)A pattern of graft material that allows for radial expansion and contraction that comprises a plurality of rows of folds with an undulating configuration with at least one apex and at least one trough and the rows of folds each have a ridge and a valley therein. At least one stent with an undulating configuration can be attached to the at least one row of folds.
(FR)L’invention concerne un motif pour matériau de greffe, permettant l’expansion et la contraction dans le sens radial, comprenant une pluralité de rangées de plis présentant une configuration en ondulation avec au moins un sommet et au moins un creux, et les rangées de plis présentant chacune une crête et une vallée. Au moins un stent avec une configuration en ondulation peut être fixé à ladite ou auxdites rangées de plis.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)