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1. WO2010030698 - OPTICAL GRID FOR HIGH PRECISION AND HIGH RESOLUTION METHOD OF WAFER SCALE NANOFABRICATION

Publication Number WO/2010/030698
Publication Date 18.03.2010
International Application No. PCT/US2009/056400
International Filing Date 09.09.2009
IPC
B23Q 17/09 2006.1
BPERFORMING OPERATIONS; TRANSPORTING
23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL, CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
17Arrangements for indicating or measuring on machine tools
09for indicating or measuring cutting pressure or cutting-tool condition, e.g. cutting ability, load on tool
CPC
G01B 11/25
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
24for measuring contours or curvatures
25by projecting a pattern, e.g. ; one or more lines,; moiré fringes on the object
G01B 11/2518
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
24for measuring contours or curvatures
25by projecting a pattern, e.g. ; one or more lines,; moiré fringes on the object
2518Projection by scanning of the object
G01Q 40/02
GPHYSICS
01MEASURING; TESTING
QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
40Calibration, e.g. of probes
02Calibration standards and methods of fabrication thereof
G01Q 80/00
GPHYSICS
01MEASURING; TESTING
QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
80Applications, other than SPM, of scanning-probe techniques
G03F 7/70383
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
G03F 7/7085
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Applicants
  • CORNELL UNIVERSITY [US]/[US] (AllExceptUS)
  • LAL, Amit [US]/[US] (UsOnly)
  • YOSHIMIZU, Norimasa [US]/[US] (UsOnly)
Inventors
  • LAL, Amit
  • YOSHIMIZU, Norimasa
Agents
  • SCHNEIDERMAN, Anne, M.
Priority Data
61/136,49309.09.2008US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) OPTICAL GRID FOR HIGH PRECISION AND HIGH RESOLUTION METHOD OF WAFER SCALE NANOFABRICATION
(FR) GRILLE OPTIQUE POUR UN PROCÉDÉ HAUTE PRÉCISION ET HAUTE RÉSOLUTION DE NANOFABRICATION À L’ÉCHELLE D’UNE TRANCHE
Abstract
(EN) A wafer-scale nano-metrology system (10) for sensing position of a nanofabrication element (16) when illuminated by a patterned optical projection defining a grid or position measuring gauge includes a frequency stabilized laser emitter (12) configured to generate a laser emission at a selected frequency, where the laser emission forms a diverging beam configured to illuminate a selected area occupied by a target fabrication object (18) having a proximal surface. An optical pattern generator (14) is illuminated by laser (12) and generates a patterned optical projection grid or gauge for projection upon the target fabrication object (18). A movable tool or nanofabrication element (16) carries an optical sensor array (50), and the sensor array detect at least a portion of the optical projection grid, and, in response to that detection, generates grid position data for use in controlling the position of the tool (16).
(FR) La présente invention concerne un système de nanométrologie à l’échelle d’une tranche (10) conçu pour détecter la position d’un élément nanofabriqué (16) lorsqu’il est illuminé par une projection optique à motifs définissant une grille ou un gabarit de mesure de position, le système comportant un émetteur laser stabilisé en fréquence (12) réalisé pour générer une émission laser à une fréquence sélectionnée. Dans ce système, l’émission laser forme un faisceau divergent conçu pour illuminer une zone sélectionnée occupée par un objet fabriqué cible (18) présentant une surface proximale. Un générateur de motifs optique (14) est illuminé par un laser (12) et génère un gabarit ou une grille de projection optique à motifs destiné à être projeté sur l’objet fabriqué cible (18). Un outil mobile ou un élément nanofabriqué (16) comporte un système de détection optique (50) et le système de détection détecte au moins une partie de la grille de projection optique et, en réponse à cette détection, génère des données de position de la grille servant à commander la position de l’outil (16).
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