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1. (WO2010030646) ANTISTATIC IONOMER COMPOSITION AND ARTICLES THEREWITH
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/030646    International Application No.:    PCT/US2009/056337
Publication Date: 18.03.2010 International Filing Date: 09.09.2009
IPC:
C08F 210/02 (2006.01)
Applicants: E. I. du Pont de Nemours and Company [US/US]; 1007 Market Street Wilmington, Delaware 19898 (US) (For All Designated States Except US).
NAKATA, Kazuyuki [JP/US]; (US) (For US Only).
WALSH, David, J. [US/US]; (US) (For US Only)
Inventors: NAKATA, Kazuyuki; (US).
WALSH, David, J.; (US)
Agent: SHAY, Lucas, K.; (US)
Priority Data:
12/207,258 09.09.2008 US
Title (EN) ANTISTATIC IONOMER COMPOSITION AND ARTICLES THEREWITH
(FR) COMPOSITION IONOMÈRE ANTISTATIQUE ET ARTICLES COMPRENANT CELLE-CI
Abstract: front page image
(EN)Disclosed are ionomer compositions neutralized by a combination of cesium and potassium that have antistatic properties. Also disclosed are articles, including laminates and monolayer or multilayer structures comprising such compositions to which neither powders nor dusts easily adhere electrostatically.
(FR)L'invention porte sur des compositions ionomères neutralisées par une combinaison de césium et de potassium qui ont des propriétés antistatiques. L'invention porte également sur des articles, comprenant des stratifiés et des structures monocouches ou multicouches comprenant de telles compositions auxquelles aucune poudre ni poussière n'adhère facilement de façon électrostatique.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)