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Machine translation
1. (WO2010030045) METHOD FOR MODIFYING A TRANSPARENT ELECTRODE FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/030045    International Application No.:    PCT/JP2009/066324
Publication Date: 18.03.2010 International Filing Date: 11.09.2009
IPC:
H01B 13/00 (2006.01), C23C 14/58 (2006.01)
Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED [JP/JP]; 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260 (JP) (For All Designated States Except US).
KURODA, Toshiya [JP/JP]; (JP) (For US Only)
Inventors: KURODA, Toshiya; (JP)
Agent: NAKAYAMA, Tohru; (JP)
Priority Data:
2008-234731 12.09.2008 JP
Title (EN) METHOD FOR MODIFYING A TRANSPARENT ELECTRODE FILM
(FR) PROCÉDÉ DE MODIFICATION D'UN FILM D'ÉLECTRODE TRANSPARENT
(JA) 透明電極膜の改質方法
Abstract: front page image
(EN)Disclosed is a method for modifying a transparent electrode film in a transparent electrode film substrate which is provided with a substrate and a transparent electrode film formed on the substrate. The method for modifying the transparent electrode film involves carrying out an annealing process in which a flash lamp is used to irradiate the transparent electrode film with a flash light having a continuous light pulse period of 0.1 to 10 msec, and the transparent electrode film is heated.
(FR)L'invention concerne un procédé de modification d'un film d'électrode transparent dans un substrat de film d'électrode transparent qui présente un substrat et un film d'électrode transparent formé sur le substrat. Le procédé de modification du film d'électrode transparent consiste à mettre en oeuvre un procédé de recuit dans lequel une lampe flash est utilisée pour irradier le film d'électrode transparent avec une lumière flash présentant une durée d'impulsion lumineuse continue de 0,1 à 10 msec., et le film d'électrode transparent est chauffé.
(JA) 基板と、該基板上に形成された透明電極膜とを備える透明電極膜付基板における透明電極膜の改質方法であって、前記透明電極膜にフラッシュランプを用いて光パルス持続時間が0.1~10msecのフラッシュ光を照射して前記透明電極膜を加熱することによりアニール処理を施すことを特徴とする透明電極膜の改質方法。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)