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Machine translation
1. (WO2010029656) MEMS DEVICE AND METHOD FOR MANUFACTURING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/029656    International Application No.:    PCT/JP2009/001970
Publication Date: 18.03.2010 International Filing Date: 30.04.2009
IPC:
B81C 1/00 (2006.01)
Applicants: PANASONIC CORPORATION [JP/JP]; 1006, Oaza Kadoma, Kadoma-shi, Osaka 5718501 (JP) (For All Designated States Except US).
MIYOSHI, Yuichi; (For US Only).
YAMAOKA, Tohru; (For US Only).
NOTAKE, Hidenori; (For US Only).
TAKEUCHI, Yusuke; (For US Only)
Inventors: MIYOSHI, Yuichi; .
YAMAOKA, Tohru; .
NOTAKE, Hidenori; .
TAKEUCHI, Yusuke;
Agent: MAEDA, Hiroshi; Osaka-Marubeni Bldg. 5-7,Hommachi 2-chome Chuo-ku, Osaka-shi, Osaka 5410053 (JP)
Priority Data:
2008-232628 10.09.2008 JP
Title (EN) MEMS DEVICE AND METHOD FOR MANUFACTURING THE SAME
(FR) DISPOSITIF MICRO-ÉLECTROMÉCANIQUE (MEMS) ET SON PROCÉDÉ DE FABRICATION
Abstract: front page image
(EN)A MEMS device, including: a substrate (101) having a first principal plane and a second principal plane opposite to the first principal plane; a through hole (110) formed in the substrate (101); and a vibrating film (105) formed over the first principal plane so as to cover the through hole (110). The first principal plane and the second principal plane are both a (110) crystal face; and the through hole (110) has a substantially rhombic shape on the second principal plane.
(FR)L’invention concerne un dispositif MEMS qui comprend: un substrat (101) présentant un premier plan principal et un second plan principal opposé au premier plan principal; un trou traversant (110) ménagé dans le substrat (101); et un film vibrant (105) formé sur le premier plan principal de manière à couvrir le trou traversant (110). Le premier plan principal et le second plan principal constituent tous deux une face cristalline; et le trou traversant (110) présente une forme sensiblement rhombique sur le second plan principal.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)