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Machine translation
1. (WO2010028704) RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/028704    International Application No.:    PCT/EP2009/003135
Publication Date: 18.03.2010 International Filing Date: 30.04.2009
IPC:
G03F 7/20 (2006.01), G21K 1/00 (2006.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; De Run 6501 NL-5504 DR Veldhoven (NL) (For All Designated States Except US).
BANINE, Vadim, Yevgenyevich [NL/NL]; (NL) (For US Only).
LOOPSTRA, Erik, Roelof [NL/NL]; (NL) (For US Only).
IVANOV, Vladimir Vitalevich [RU/RU]; (RU) (For US Only).
KRIVTSUN, Vladimir Mihailovitch [RU/RU]; (RU) (For US Only)
Inventors: BANINE, Vadim, Yevgenyevich; (NL).
LOOPSTRA, Erik, Roelof; (NL).
IVANOV, Vladimir Vitalevich; (RU).
KRIVTSUN, Vladimir Mihailovitch; (RU)
Agent: VAN DEN HOOVEN, Jan; ASML Corporate Intellectual Property P.O. Box 324 NL-5500 AH Veldhoven (NL)
Priority Data:
61/136,494 09.09.2008 US
61/136,833 07.10.2008 US
Title (EN) RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
(FR) SYSTÈME DE RAYONNEMENT ET APPAREIL LITHOGRAPHIQUE
Abstract: front page image
(EN)A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source (50) configured to generate a plasma that emits radiation and debris, and a radiation collector (70) configured to direct collected radiation to a radiation beam emission aperture (60). A magnetic field generator (200) is configured to generate a magnetic field with a gradient in magnetic "field strength to direct the plasma away from the radiation collector (70).
(FR)L'invention porte sur un système de rayonnement configuré pour générer un faisceau de rayonnement. Le système de rayonnement comprend une source de rayonnement (50) configurée pour générer un plasma qui émet un rayonnement et des débris, et un capteur de rayonnement (70) configuré pour diriger le rayonnement capté vers une ouverture d'émission de faisceau de rayonnement (60). Un générateur de champ magnétique (200) est configuré pour générer un champ magnétique avec un gradient dans la force du champ magnétique pour éloigner le plasma du capteur de rayonnement (70).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)