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1. (WO2010028330) ABRASION RESISTANT MEMBRANE STRUCTURE AND METHOD OF FORMING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/028330    International Application No.:    PCT/US2009/056164
Publication Date: 11.03.2010 International Filing Date: 08.09.2009
Chapter 2 Demand Filed:    02.07.2010    
IPC:
B01D 29/50 (2006.01)
Applicants: HPD, LLC [US/US]; 23563 W. Main Street IL Route 126 Plainfield, Illinois 60544 (US) (For All Designated States Except US).
BISHOP, Bruce [US/US]; (US) (For US Only).
CARDIN, Jeremy [US/US]; (US) (For US Only).
HOFFMAN, Christopher [US/US]; (US) (For US Only).
HIGGINS, Richard [US/US]; (US) (For US Only)
Inventors: BISHOP, Bruce; (US).
CARDIN, Jeremy; (US).
HOFFMAN, Christopher; (US).
HIGGINS, Richard; (US)
Agent: HPD, LLC; c/o Larry L. Coats COATS & BENNETT, PLLC 1400 Crescent Green, Suite 300 Cary, North Carolina 27518 (US)
Common
Representative:
HPD, LLC; c/o Larry L. Coats COATS & BENNETT, PLLC 1400 Crescent Green, Suite 300 Cary, North Carolina 27518 (US)
Priority Data:
61/094,614 05.09.2008 US
12/554,192 04.09.2009 US
Title (EN) ABRASION RESISTANT MEMBRANE STRUCTURE AND METHOD OF FORMING THE SAME
(FR) STRUCTURE DE MEMBRANE RÉSISTANTE À L'ABRASION ET SON PROCÉDÉ DE FORMATION
Abstract: front page image
(EN)A membrane filtering device includes a substrate, a support membrane supported by the substrate, and a separation membrane supported by the support membrane. The separation membrane includes material that is substantially embedded into pores of the underlying support membrane. Optionally, the support membrane includes particles that are also substantially embedded into pores of the substrate.
(FR)L'invention concerne un dispositif de filtration à membrane qui comprend un substrat, une membrane support soutenue par le substrat et une membrane de séparation soutenue par la membrane support. La membrane de séparation comprend un matériau qui est sensiblement incorporé dans les pores de la membrane support sous-jacente. La membrane support comprend éventuellement des particules qui sont également sensiblement incorporées dans les pores du substrat.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)