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Machine translation
1. (WO2010028255) LOW PRESSURE POLISHING METHOD AND APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/028255    International Application No.:    PCT/US2009/056056
Publication Date: 11.03.2010 International Filing Date: 04.09.2009
IPC:
B24B 7/18 (2006.01), B24D 13/06 (2006.01), B24D 13/16 (2006.01)
Applicants: EPOXI TECH INC. [US/US]; 32700 Industrial Drive Madison Heights, MI 48071 (US) (For All Designated States Except US).
PALUSHAJ, Simon [US/US]; (US) (For US Only)
Inventors: PALUSHAJ, Simon; (US)
Agent: BEJIN, Thomas, E.; (US)
Priority Data:
12/427,413 21.04.2009 US
61/095,077 08.09.2008 US
Title (EN) LOW PRESSURE POLISHING METHOD AND APPARATUS
(FR) PROCÉDÉ ET APPAREIL DE POLISSAGE À BASSE PRESSION
Abstract: front page image
(EN)An improved low pressure low speed concrete polishing apparatus and method of cleaning and polishing a floor is used with a conventional rotary flooring machine. A polishing pad has interchangeable polymer strips that are slideably received within the housing of the pad. The polymer strips have an abrasive material embedded therein which collectively work to polish the floor while cleaning the floor during normal low speed floor cleaning conditions.
(FR)L’invention concerne un appareil amélioré de polissage de ciment à faible vitesse et à basse pression et un procédé de nettoyage et de polissage de sol que l’on utilise avec une machine de traitement des sols rotative classique. Un patin de polissage comprend des bandes polymères interchangeables qui sont insérées par coulissement dans un logement du patin. Les bandes polymères comportent un matériau abrasif noyé dans celles-ci, et fonctionnent collectivement de manière à polir le sol tout en nettoyant le sol lors de conditions normales de nettoyage du sol à faible vitesse.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)