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1. (WO2010027854) POROUS FILMS BY A TEMPLATING CO-ASSEMBLY PROCESS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/027854    International Application No.:    PCT/US2009/055044
Publication Date: 11.03.2010 International Filing Date: 26.08.2009
IPC:
G02B 6/122 (2006.01)
Applicants: PRESIDENT AND FELLOWS OF HARVARD COLLEGE [US/US]; 17 Quincy Street Cambridge, MA 02138 (US) (For All Designated States Except US).
HATTON, Benjamin [CA/US]; (US) (For US Only).
AIZENBERG, Joanna [US/US]; (US) (For US Only)
Inventors: HATTON, Benjamin; (US).
AIZENBERG, Joanna; (US)
Agent: SCOZZAFAVA, Mary Rose; (US)
Priority Data:
61/091,941 26.08.2008 US
Title (EN) POROUS FILMS BY A TEMPLATING CO-ASSEMBLY PROCESS
(FR) FILMS POREUX OBTENUS SELON UN PROCÉDÉ DE CO-ASSEMBLAGE ET DE FORMATION DE MATRICE
Abstract: front page image
(EN)A method of making a composite includes providing a particle suspension comprising colloidal particles (430) and a soluble matrix precursor (440); and co-depositing the particles and the matrix precursor on a surface in a process that provides a composite of an ordered colloidal crystal comprised of colloidal particles (430) with interstitial matrix (440). Optionally the templated colloidal particles can be removed to provide a defect-free inverse opal structure.
(FR)L'invention concerne un procédé de production d'un composite qui consiste à préparer une suspension particulaire comprenant des particules colloïdales (430) et un précurseur de matrice soluble (440); et à déposer conjointement les particules et le précurseur de matrice sur une surface au cours d'un processus qui permet d'obtenir un composite de cristal colloïdal ordonné constitué de particules colloïdales (430) et d'une matrice interstitielle (440). Eventuellement, les particules colloïdales incorporées dans la matrice peuvent être éliminées afin d'obtenir une structure opale inverse exempte de défauts.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)