WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2010027253) METHOD FOR PRODUCING A LIGHT TRAPPING LAYER ON A TRANSPARENT SUBSTRATE FOR USE IN A PHOTOVOLTAIC DEVICE, A METHOD FOR PRODUCING A PHOTOVOLTAIC DEVICE AS WELL AS SUCH A PHOTOVOLTAIC DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/027253    International Application No.:    PCT/NL2009/000169
Publication Date: 11.03.2010 International Filing Date: 03.09.2009
Chapter 2 Demand Filed:    23.11.2010    
IPC:
H01L 31/0236 (2006.01)
Applicants: MOSER BAER PHOTO VOLTAIC Ltd. [IN/IN]; 43b, Okhla Industrial Estate 110020 New Delhi (IN) (For All Designated States Except US).
BORG, Hermanus, Johannes [NL/NL]; (NL) (For US Only).
PEETERS, Patrick, Godefridus, Jacobus, Maria [NL/NL]; (NL) (For US Only)
Inventors: BORG, Hermanus, Johannes; (NL).
PEETERS, Patrick, Godefridus, Jacobus, Maria; (NL)
Agent: CAYLI, Hudya; Paragon Consultancy Incorporated Koza Sokak 63/2 G.O.P. 06540 Ankara/ (TR)
Priority Data:
1035889 03.09.2008 NL
Title (EN) METHOD FOR PRODUCING A LIGHT TRAPPING LAYER ON A TRANSPARENT SUBSTRATE FOR USE IN A PHOTOVOLTAIC DEVICE, A METHOD FOR PRODUCING A PHOTOVOLTAIC DEVICE AS WELL AS SUCH A PHOTOVOLTAIC DEVICE
(FR) PROCÉDÉ DE PRODUCTION D'UNE COUCHE DE PIÉGEAGE DE LUMIÈRE SUR UN SUBSTRAT TRANSPARENT DESTINÉ À ÊTRE UTILISÉ DANS UN DISPOSITIF PHOTOVOLTAÏQUE, PROCÉDÉ DE PRODUCTION D'UN DISPOSITIF PHOTOVOLTAÏQUE AINSI QUE DISPOSITIF PHOTOVOLTAÏQUE
Abstract: front page image
(EN)The invention relates to method for producing a light trapping layer on a transparent substrate for use in a photovoltaic device comprising at least the steps of: i) providing a transparent substrate having a first substantially flat surface; ii) applying a light trapping texture in the exposed surface of the transparent substrate. The method is according to the invention characterized in that step ii) comprises the steps of: ii-1) providing a replication substrate having a replication texture exhibiting a negative image of the light trapping texture to be applied on said exposed surface of the transparent substrate; ii-2) replicating said negative replication texture in the exposed surface of the transparent substrate.
(FR)L'invention concerne un procédé de production d'une couche de piégeage de lumière sur un substrat transparent destiné à être utilisé dans un dispositif photovoltaïque, comprenant au moins les étapes consistant: i) à utiliser un substrat transparent présentant une première surface sensiblement plane; ii) à appliquer une texture de piégeage de lumière dans la surface exposée du substrat transparent. Le procédé selon l'invention est caractérisé en ce que l'étape ii) comprend les étapes consistant : ii-1) à utiliser un substrat de reproduction présentant une texture de reproduction possédant une image négative de la texture de piégeage de lumière destinée à être appliquée sur ladite surface exposée du substrat transparent; ii-2) à reproduire ladite texture de reproduction négative dans la surface exposée du substrat transparent.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)