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1. (WO2010027184) WASTE GAS REMOVAL SYSTEM USING LOW-PRESSURE AND ATMOSPHERIC PRESSURE PLASMA
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/027184    International Application No.:    PCT/KR2009/004928
Publication Date: 11.03.2010 International Filing Date: 02.09.2009
IPC:
B01D 53/32 (2006.01)
Applicants: TRIPLECORESKOREA [KR/KR]; 27-5,Yeongchon-ri,Dongtan-myeon, Hwaseong-si Gyeonggi-do 445-813 (KR) (For All Designated States Except US).
KIM, Ik Kyeon [KR/KR]; (KR) (For US Only).
KIM, Hong Jin [KR/KR]; (KR) (For US Only).
CHANG, Hong Ki [KR/KR]; (KR) (For US Only).
JI, Young Yeon [KR/KR]; (KR) (For US Only)
Inventors: KIM, Ik Kyeon; (KR).
KIM, Hong Jin; (KR).
CHANG, Hong Ki; (KR).
JI, Young Yeon; (KR)
Agent: KIM, Kang Wook; (KR)
Priority Data:
10-2008-0086283 02.09.2008 KR
Title (EN) WASTE GAS REMOVAL SYSTEM USING LOW-PRESSURE AND ATMOSPHERIC PRESSURE PLASMA
(FR) SYSTEME D'ELIMINATION DE GAZ RESIDUAIRES AU MOYEN DE PLASMA BASSE PRESSION ET DE PLASMA A PRESSION ATMOSPHERIQUE
(KO) 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템
Abstract: front page image
(EN)The present invention relates to a waste gas removal system for removal of harmful atmosphere-polluting gases emitted by various electronics industries including the semiconductor industry. More particularly, it provides a waste gas removal system using low-pressure plasma and plasma at atmospheric pressure whereby harmful gas emitted from a vacuum chamber is first treated with low-pressure hollow-cathode discharge plasma. The harmful gas thus treated is passed one more time through electromagnetic plasma at atmospheric pressure, thereby completely removing it.
(FR)L'invention concerne un système d'élimination de gaz résiduaires destiné à éliminer des gaz nocifs polluant l'atmosphère, émis par diverses industries électroniques, notamment l'industrie des semi-conducteurs. L'invention concerne plus particulièrement un système d'élimination de gaz résiduaires au moyen de plasma basse pression et de plasma à pression atmosphérique, les gaz nocifs émis par une chambre à vide étant d'abord traités par plasma de décharge à cathode creuse basse pression. Lorsque les gaz nocifs traités sont évacués à pression atmosphérique, ils sont envoyés à nouveau à travers un plasma électromagnétique à pression atmosphérique, ce qui permet leur élimination totale.
(KO)본 발명은 반도체 산업을 포함한 각종 전자 산업으로부터 배출되는 대기오염 유해가스를 제거하기 위한 폐가스 제거 시스템에 관한 것으로, 더욱 상세하게는 진공 챔버로부터 배출되는 유해가스를 저압 동공음극 방전 플라즈마로 처리하고 상기 저압 동공음극 방전 플라즈마로 처리된 유해가스가 대기압으로 배출될 때, 다시 대기압 전자파 플라즈마로 유해가스를 통과시켜 완벽하게 제거하는 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템을 제공하고 된다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)