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1. (WO2010025950) A SUBSTRATE, AN INSPECTION APPARATUS, AND A LITHOGRAPHIC APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/025950    International Application No.:    PCT/EP2009/006473
Publication Date: 11.03.2010 International Filing Date: 07.09.2009
IPC:
G03F 7/20 (2006.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; De Run 6501 NL-5504 DR Veldhoven (NL) (For All Designated States Except US).
SMILDE, Hendrik [NL/NL]; (NL) (For US Only).
COENE, Willem [BE/NL]; (NL) (For US Only)
Inventors: SMILDE, Hendrik; (NL).
COENE, Willem; (NL)
Agent: VAN DEN HOOVEN, Jan; De Run 6501 NL-5504 DR Veldhoven (NL)
Priority Data:
61/095,084 08.09.2008 US
Title (EN) A SUBSTRATE, AN INSPECTION APPARATUS, AND A LITHOGRAPHIC APPARATUS
(FR) SUBSTRAT, APPAREIL D'INSPECTION ET APPAREIL LITHOGRAPHIQUE
Abstract: front page image
(EN)A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced
(FR)L'invention concerne une cible comprenant un réseau, permettant de mesurer une erreur de chevauchement ou une dimension critique d'un substrat. Dans un exemple selon l'invention, les lignes du réseau sont agencées selon un angle d'environ 45° par rapport aux bords de la cible. En conséquence, l'ordre de diffraction de la réflexion du réseau présente des sous-maxima non alignés le long de la ligne sur laquelle les autres ordres de diffraction sont placés et le chevauchement d'intensité avec les autres ordres de diffraction est réduit.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)