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Machine translation
1. (WO2010025624) RINSE SOLUTION FOR REMOVAL OF PLASM ETCHING RESIDUES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/025624    International Application No.:    PCT/CN2009/001001
Publication Date: 11.03.2010 International Filing Date: 04.09.2009
Chapter 2 Demand Filed:    28.06.2010    
IPC:
G03F 7/42 (2006.01), H01L 21/02 (2006.01), C23G 1/06 (2006.01), C11D 1/66 (2006.01)
Applicants: ANJI MICROELECTRONICS TECHNOLOGY (SHANGHAI) CO., LTD [CN/CN]; T6-9, No. 5001, Huadong Road Shanghai Jinqiao Export Processing Zone (South Zone) Pudong, New Area Shanghai 201201 (CN) (For All Designated States Except US).
LIU, Bing [CN/CN]; (CN) (For US Only).
PENG, Libbert, Hongxiu [CN/CN]; (CN) (For US Only).
YU, Joey, Hao [CN/CN]; (CN) (For US Only)
Inventors: LIU, Bing; (CN).
PENG, Libbert, Hongxiu; (CN).
YU, Joey, Hao; (CN)
Agent: HANHONG LAW FIRM; Room 1505, New Huang Pu Financial Building No. 61 East Nanjing Road Shanghai 200002 (CN)
Priority Data:
200810042569.9 05.09.2008 CN
Title (EN) RINSE SOLUTION FOR REMOVAL OF PLASM ETCHING RESIDUES
(FR) LIQUIDE DE NETTOYAGE DES RÉSIDUS DU DÉCAPAGE DE PLASMA
(ZH) 一种等离子刻蚀残留物清洗液
Abstract: front page image
(EN)A rinse solution for removal of plasm etching residues includes solvent,water and fluoride. The rinse solution also includes a kind of stelliform polymer with pigment affinity group. The rinse solution can be used to remove plasm etching residues. And the corrosion rate of the rinse solution to some metals especially such as Al and to some non-metals is low. The rinse solution has larger operation window.
(FR)L'invention concerne un liquide de nettoyage des résidus du décapage de plasma composé de solvant, d'eau, de fluor et d'un polymère en étoile contenant un élément apparenté au pigment et un radical. Ledit liquide de nettoyage des résidus du décapage de plasma permet d'éliminer les résidus bloquant la lumière laissés après un décapage de plasma, permet d'éliminer l'érosion métallique (surtout celle de l'aluminium) et non-métallique, et a une fenêtre d'opération de nettoyage et de rinçage relativement large.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)