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1. (WO2010024320) ABERRATION-CORRECTING METHOD, LASER PROCESSING METHOD USING SAID ABERRATION-CORRECTING METHOD, LASER IRRADIATION METHOD USING SAID ABERRATION-CORRECTING METHOD, ABERRATION-CORRECTING DEVICE AND ABERRATION-CORRECTING PROGRAM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/024320    International Application No.:    PCT/JP2009/064939
Publication Date: 04.03.2010 International Filing Date: 27.08.2009
IPC:
G02F 1/01 (2006.01), B23K 26/06 (2006.01), B23K 26/073 (2006.01), H01S 3/10 (2006.01)
Applicants: HAMAMATSU PHOTONICS K.K. [JP/JP]; 1126-1, Ichino-cho, Higashi-ku, Hamamatsu-shi, Shizuoka 4358558 (JP) (For All Designated States Except US).
ITO Haruyasu [JP/JP]; (JP) (For US Only).
MATSUMOTO Naoya [JP/JP]; (JP) (For US Only).
INOUE Takashi [JP/JP]; (JP) (For US Only)
Inventors: ITO Haruyasu; (JP).
MATSUMOTO Naoya; (JP).
INOUE Takashi; (JP)
Agent: HASEGAWA Yoshiki; SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA (Meiji Yasuda Life Bldg.) 9th fl., 1-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1000005 (JP)
Priority Data:
2008-223582 01.09.2008 JP
2009-125759 25.05.2009 JP
Title (EN) ABERRATION-CORRECTING METHOD, LASER PROCESSING METHOD USING SAID ABERRATION-CORRECTING METHOD, LASER IRRADIATION METHOD USING SAID ABERRATION-CORRECTING METHOD, ABERRATION-CORRECTING DEVICE AND ABERRATION-CORRECTING PROGRAM
(FR) PROCÉDÉ DE CORRECTION DES ABERRATIONS, PROCÉDÉ DE TRAITEMENT LASER UTILISANT LEDIT PROCÉDÉ DE CORRECTION DES ABERRATIONS, PROCÉDÉ D'IRRADIATION LASER UTILISANT LEDIT PROCÉDÉ DE CORRECTION DES ABERRATIONS, DISPOSITIF DE CORRECTION DES ABERRATIONS ET PROGRAMME DE CORRECTION DES ABERRATIONS
(JA) 収差補正方法、この収差補正方法を用いたレーザ加工方法、この収差補正方法を用いたレーザ照射方法、収差補正装置、及び、収差補正プログラム
Abstract: front page image
(EN)In one embodiment of an aberration-correcting method, the aberration-correcting method for a laser-irradiating device (1) that concentrates laser light inside a medium (60) that transmits light is characterized in that laser light aberration is corrected so that the point of convergence of the laser light is positioned in the region of the aberration generated in said medium. If the refractive index of the medium (60) is n, the depth of the medium (60) from the plane of incidence to the focal point of the lens (50) is d and the aberration generated by the medium (60) is Ds, said region of aberration is between n × d and n × d + Ds from the incident plane of the medium (60).
(FR)Dans un mode de réalisation d'un procédé de correction des aberrations, le procédé de correction des aberrations destiné à un dispositif d'irradiation laser (1) qui concentre la lumière laser dans un milieu (60) qui transmet la lumière se caractérise en ce qu'une aberration de la lumière laser est corrigée de sorte que le point de convergence de la lumière laser soit positionnée dans la région de l'aberration générée dans ledit milieu. Si l'indice de réfraction du milieu (60) est n, la profondeur du milieu (60) du plan d'incidence jusqu'au point focal de la lentille (50) est d et l'aberration générée par le milieu (60) est Ds, ladite région d'aberration se situant entre n x d et n x d + Ds depuis le plan incident du milieu (60).
(JA) 本発明の一実施形態に係る収差補正方法では、光透過性を有する媒質60内部にレーザ光を集光するレーザ照射装置1の収差補正方法において、レーザ光の集光点が前記媒質内部に発生する収差範囲の間に位置するように、レーザ光の収差を補正することを特徴とする。この収差範囲は、媒質60の屈折率をn、媒質60の入射面からレンズ50の焦点までの深さをd、媒質60によって発生する収差をΔsとすると、媒質60の入射面からn×d以上n×d+Δs以下である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)