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1. WO2010024187 - CONTINUOUS FILM FORMING APPARATUS

Publication Number WO/2010/024187
Publication Date 04.03.2010
International Application No. PCT/JP2009/064610
International Filing Date 21.08.2009
IPC
C23C 14/56 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
CPC
C23C 14/20
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
14Metallic material, boron or silicon
20on organic substrates
C23C 14/24
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
C23C 14/56
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
C23C 14/562
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
562for coating elongated substrates
Applicants
  • 株式会社神戸製鋼所 KABUSHIKI KAISHA KOBE SEIKO SHO [JP]/[JP] (AllExceptUS)
  • 玉垣 浩 TAMAGAKI, Hiroshi (UsOnly)
  • 瀬川 利規 SEGAWA, Toshiki (UsOnly)
Inventors
  • 玉垣 浩 TAMAGAKI, Hiroshi
  • 瀬川 利規 SEGAWA, Toshiki
Agents
  • 小谷 悦司 KOTANI, Etsuji
Priority Data
2008-21780527.08.2008JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) CONTINUOUS FILM FORMING APPARATUS
(FR) APPAREIL PERMETTANT LA FORMATION CONTINUE D'UN FILM
(JA) 連続成膜装置
Abstract
(EN) Provided is a continuous film forming apparatus wherein replacement operations of a feeding unit and a take-up unit are easily performed.  The continuous film forming apparatus is provided with: a vacuum chamber (1); a film forming roll (2); evaporation sources (7L1, 7L2, 7R) which supply a film forming substance to a material from the side of the material which is wound on the film forming roll and on which a film is to be formed; a feeding unit (3) which supplies the material to the film forming roll (2); and a take-up unit (4) which takes up the material after the film is formed thereon.  The vacuum chamber (1) is provided with: an evaporation source opening for carrying out and carrying in the evaporation sources; evaporation source door sections (16L, 16R) which open and close the evaporation source opening; another opening provided for the material on which the film is to be formed, besides the evaporation source opening, for the purpose of carrying out and carrying in the feeding unit (3) and the take-up unit (4); and door sections (17L, 17R) which are provided for the material and open and close the opening provided for the material.
(FR) La présente invention porte sur un appareil qui permet la formation continue d'un film et dans lequel des opérations de remplacement d'une unité d'alimentation et d'une unité de réception sont facilement effectuées. L'appareil permettant la formation continue d'un film est pourvu : d'une chambre à vide (1); d'un rouleau assurant la formation du film (2); de sources d'évaporation (7L1, 7L2, 7R) qui fournissent une substance filmogène à un matériau depuis la face du matériau qui est enroulée sur le rouleau assurant la formation du film et sur laquelle un film doit être enroulé; d'une unité d'alimentation (3) qui fournit le matériau au rouleau assurant la formation du film (2); et d'une unité de réception (4) qui réceptionne le matériau après que le film est formé sur celle-ci. La chambre à vide (1) est pourvue : d'une ouverture de source d'évaporation pour évacuer et faire pénétrer les sources d'évaporation; de sections de porte de source d'évaporation (16L, 16R) qui ouvrent et ferment l'ouverture de source d'évaporation; d'une autre ouverture, en plus de l'ouverture de source d'évaporation, conçue pour le matériau sur lequel le film doit être formé, dans le but d'évacuer et de faire pénétrer le matériau dans l'unité d'alimentation (3) et l'unité de réception (4); et de sections de porte (17L, 17R) qui sont conçues pour le matériau et qui ouvrent et ferment l'ouverture conçue pour le matériau.
(JA) この発明は、巻出ユニット、巻取ユニットの交換作業が容易な連続成膜装置を提供する。この連続成膜装置は、真空チャンバー1と、成膜ロール2と、これに巻き掛けられた被成膜材に側方から成膜物質を供給する蒸発源7L1,7L2,7Rと、前記被成膜材を前記成膜ロール2に供給する巻出ユニット3及び成膜後の被成膜材を巻き取る巻取ユニット4とを備える。真空チャンバー1は、蒸発源の搬出および搬入のための蒸発源用開口と、これを開閉する蒸発源用ドア部16L、16Rと、前記蒸発源用開口とは別に設けられる、巻出ユニット3および巻取ユニット4の搬出および搬入のための被成膜材用開口と、これを開閉する被成膜材用ドア部17L,17Rとを有する。
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