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1. (WO2010022840) SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/022840    International Application No.:    PCT/EP2009/005489
Publication Date: 04.03.2010 International Filing Date: 29.07.2009
IPC:
G03F 7/20 (2006.01), G21K 1/00 (2006.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; De Run 6501 NL-5504 DR Veldhoven (NL) (For All Designated States Except US).
SOER, Wouter, Anthon [NL/NL]; (NL) (For US Only).
VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus [NL/NL]; (NL) (For US Only).
JAK, Martin, Jacobus, Johan [NL/NL]; (NL) (For US Only)
Inventors: SOER, Wouter, Anthon; (NL).
VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus; (NL).
JAK, Martin, Jacobus, Johan; (NL)
Agent: SLENDERS, P.J.W.; ASML Netherlands B.V. De Run 6501 NL-5504 DR Veldhoven (NL)
Priority Data:
61/136,347 29.08.2008 US
61/193,255 12.11.2008 US
Title (EN) SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD
(FR) FILTRE ASSURANT LA PURETÉ SPECTRALE, APPAREIL LITHOGRAPHIQUE COMPRENANT UN TEL FILTRE ASSURANT LA PURETÉ SPECTRALE ET PROCÉDÉ DE FABRICATION DU DISPOSITIF
Abstract: front page image
(EN)A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first wavelength and allow at least a portion of radiation of a second wavelength to transmit through the aperture. The first wavelength is larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.
(FR)La présente invention porte sur un filtre assurant la pureté spectrale qui comprend une ouverture. Le filtre assurant la pureté spectrale est configuré pour améliorer la pureté spectrale d'un faisceau de rayonnement en étant configuré pour absorber le rayonnement ayant une première longueur d'onde et permettre la transmission à travers l'ouverture d'au moins une partie du rayonnement ayant une seconde longueur d'onde. La première longueur d'onde est supérieure à la seconde longueur d'onde. Le filtre assurant la pureté spectrale peut être utilisé pour améliorer la pureté spectrale d'un faisceau de rayonnement ultraviolet extrême (EUV).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)