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1. (WO2010022565) TETRAZOLE DERIVATIVES AND LIGHT SENSITIVE POLY(DIMETHYLSILOXANE) FOR COMPLEX PATTERN FORMATION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2010/022565    International Application No.:    PCT/CN2008/072206
Publication Date: 04.03.2010 International Filing Date: 29.08.2008
IPC:
C07D 257/06 (2006.01), C08J 7/12 (2006.01), B01L 3/00 (2006.01), B32B 25/20 (2006.01), B32B 33/00 (2006.01), C08J 7/16 (2006.01)
Applicants: PEKING UNIVERSITY [CN/CN]; 3214 Jun Zhai #5 Yi He Yuan Road, Haidian District Beijing 100871 (CN) (For All Designated States Except US).
MA, Hongwei [CN/CN]; (CN) (For US Only).
FU, Long [CN/CN]; (CN) (For US Only)
Inventors: MA, Hongwei; (CN).
FU, Long; (CN)
Agent: UNITALEN ATTORNEYS AT LAW; 7th Floor, Scitech Place, No.22, Jian Guo Men Wai Ave., Chao Yang District, Beijing 100004 (CN)
Priority Data:
Title (EN) TETRAZOLE DERIVATIVES AND LIGHT SENSITIVE POLY(DIMETHYLSILOXANE) FOR COMPLEX PATTERN FORMATION
(FR) DÉRIVÉS DE TÉTRAZOLE ET POLY(DIMÉTHYLSILOXANE) SENSIBLE À LA LUMIÈRE POUR LA FORMATION D’UN MOTIF COMPLEXE
Abstract: front page image
(EN)Tetrazole derivatives, poly(dimethylsiloxane) (PDMS) surface-functionalized with the same and methods for making said PDMS. The surface-functionalized PDMS is applicable in the general fields of microfluidics, bioMEMS (bio-microelectromechanical systems), soft lithography, and other related biotechnology fields.
(FR)La présente invention concerne des dérivés de tétrazole, du poly(diméthylsiloxane) (PDMS) fonctionnalisé à la surface par ceux-ci et des procédés de fabrication dudit PDMS. Le PDMS fonctionnalisé à la surface est applicable dans les domaines généraux des microfluides, des bioMEMS (systèmes bio-microélectromécaniques), de la lithographie douce et d’autres domaines de biotechnologie apparentés.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)