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1. WO2009156225 - OVERLAY MEASUREMENT APPARATUS, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD USING SUCH OVERLAY MEASUREMENT APPARATUS

Publication Number WO/2009/156225
Publication Date 30.12.2009
International Application No. PCT/EP2009/055809
International Filing Date 14.05.2009
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70633
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
70633Overlay
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL] (AllExceptUS)
  • DEN BOEF, Arie [NL]/[NL] (UsOnly)
Inventors
  • DEN BOEF, Arie
Agents
  • VAN DEN HOOVEN, Jan
Priority Data
61/075,96926.06.2008US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) OVERLAY MEASUREMENT APPARATUS, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD USING SUCH OVERLAY MEASUREMENT APPARATUS
(FR) APPAREIL DE MESURE DE SUPERPOSITION, APPAREIL LITHOGRAPHIQUE, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF UTILISANT L'APPAREIL DE MESURE EN QUESTION
Abstract
(EN)
An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.
(FR)
L'invention concerne un appareil de mesure de superposition qui comporte une source de lumière polarisée illuminant un échantillon par le biais d'un faisceau de lumière polarisée et un système optique captant la lumière diffusée par l'échantillon. Ce système optique comprend un polariseur qui transmet une composante de polarisation orthogonale qui est orthogonale par rapport à une direction de polarisation du faisceau considéré. Un détecteur mesure l'intensité de cette composante. Une unité de traitement reliée au détecteur est conçue pour traiter ladite composante aux fins de mesure en métrologie de superposition, sur la base de données asymétriques dérivées cette composante.
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