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1. (WO2009143328) ON WIRE LITHOGRAPHY-BASED MOLECULAR TRANSPORT JUNCTIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/143328    International Application No.:    PCT/US2009/044803
Publication Date: 26.11.2009 International Filing Date: 21.05.2009
IPC:
B32B 1/00 (2006.01)
Applicants: NORTHWESTERN UNIVERSITY [US/US]; 633 Clark Street Evanston, IL 60208 (US) (For All Designated States Except US).
MIRKIN, Chad, A. [US/US]; (US) (For US Only).
CHEN, Xiaodong [CN/US]; (US) (For US Only).
JEON, You-moon [KR/US]; (US) (For US Only).
JANG, Jae-won [KR/US]; (US) (For US Only).
QIN, Lidong [CN/US]; (US) (For US Only)
Inventors: MIRKIN, Chad, A.; (US).
CHEN, Xiaodong; (US).
JEON, You-moon; (US).
JANG, Jae-won; (US).
QIN, Lidong; (US)
Agent: DANEK, Shelley, C.; (US)
Priority Data:
61/055,039 21.05.2008 US
Title (EN) ON WIRE LITHOGRAPHY-BASED MOLECULAR TRANSPORT JUNCTIONS
(FR) JONCTIONS DE TRANSPORT MOLÉCULAIRES PAR LITHOGRAPHIE SUR FIL
Abstract: front page image
(EN)On- wire lithography (OWL) fabricated nanogaps are used to construct molecular transport junctions (MTJs) through the assembly of molecular wires across a nanogap formed between two gold electrodes. Also disclosed are methods of characterizing a MTJ and optimizing gap size for two molecular wires of different dimensions.
(FR)L'invention porte sur des nano-espaces fabriqués par lithographie sur fil (OWL) qui sont utilisés pour construire des jonctions de transport moléculaires (MTJ) par l'assemblage de fils moléculaires à travers un nano-espace formé entre deux électrodes en or. L'invention porte également sur des procédés de caractérisation d'une MTJ et d'optimisation d'une dimension d'espace pour deux fils moléculaires de différentes dimensions.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)