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1. (WO2009143026) METHOD OF FORMING AN ELECTRONIC DEVICE USING A SEPARATION TECHNIQUE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/143026    International Application No.:    PCT/US2009/044203
Publication Date: 26.11.2009 International Filing Date: 15.05.2009
IPC:
H01L 21/20 (2006.01)
Applicants: ASTROWATT, INC. [US/US]; 16900 Willow Oak Lane Round Rock, TX 78681 (US) (For All Designated States Except US)
Inventors: MATHEW, Leo; (US).
JAWARANI, Dharmesh; (US)
Agent: LARSON NEWMAN ABEL & POLANSKY, LLP; (US)
Priority Data:
61/054,139 17.05.2008 US
Title (EN) METHOD OF FORMING AN ELECTRONIC DEVICE USING A SEPARATION TECHNIQUE
(FR) PROCÉDÉ PERMETTANT DE FABRIQUER UN DISPOSITIF ÉLECTRONIQUE GRÂCE À UNE TECHNIQUE DE SÉPARATION
Abstract: front page image
(EN)A method of forming an electronic device can include forming a patterned layer adjacent to a side of a substrate including a semiconductor material. The method can also include separating a semiconductor layer and the patterned layer from the substrate, wherein the semiconductor layer is a portion of the substrate.
(FR)Un procédé permettant de fabriquer un dispositif électronique consiste à fabriquer une couche structurée à proximité d’une face d’un substrat comprenant un matériau semi-conducteur. Ledit procédé consiste également à séparer du substrat une couche semi-conductrice et ladite couche structurée, cette couche semi-conductrice représentant une partie du substrat.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)