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1. (WO2009142710) ELECTROSTATIC CHUCK
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2009/142710 International Application No.: PCT/US2009/003015
Publication Date: 26.11.2009 International Filing Date: 15.05.2009
IPC:
H01L 21/683 (2006.01) ,H01L 21/687 (2006.01) ,H02N 13/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
H ELECTRICITY
02
GENERATION, CONVERSION, OR DISTRIBUTION OF ELECTRIC POWER
N
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
13
Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Applicants:
ENTEGRIS, INC. [US/US]; 129 Concord Road Building 2 Billerica, MA 01821, US (AllExceptUS)
COOKE, Richard, A. [US/US]; US (UsOnly)
Inventors:
COOKE, Richard, A.; US
Agent:
CARROLL, Alice, O.; Hamilton, Brook, Smith & Reynolds, P.C. 530 Virginia Road, P.O. Box 9133 Concord, MA 01742-9133, US
Priority Data:
61/054,25919.05.2008US
61/094,70005.09.2008US
Title (EN) ELECTROSTATIC CHUCK
(FR) MANDRIN ÉLECTROSTATIQUE
Abstract:
(EN) In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck. The surface layer includes a plurality of protrusions extending to a height above portions of the surface layer surrounding the protrusions to support the substrate upon the protrusions during electrostatic clamping of the substrate. The protrusions are substantially equally spaced across the surface layer as measured by a center to center distance between pairs of neighboring protrusions.
(FR) La présente invention concerne, selon un mode de réalisation, un mandrin électrostatique qui comprend une électrode, et une couche de surface activée par une tension dans l'électrode pour former une charge électrique pour serrer de façon électrostatique un substrat sur le mandrin électrostatique. La couche de surface comprend une pluralité de protubérances qui s'étendent jusqu'à une hauteur au-dessus de parties de la couche de surface entourant les protubérances pour supporter le substrat sur les protubérances durant le serrage électrostatique du substrat. Les protubérances sont espacées de façon sensiblement égale sur la couche de surface lorsqu'elles sont mesurées selon une distance de centre à centre entre des paires de protubérances voisines.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)