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1. (WO2009142400) IN-LINE DIE CLEANING DEVICE AND CLEANING METHOD EMPLOYING PLASMA
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/142400    International Application No.:    PCT/KR2009/002327
Publication Date: 26.11.2009 International Filing Date: 01.05.2009
IPC:
H01L 21/304 (2006.01)
Applicants: PSM INC. [KR/KR]; 707, MegaCenter, SKn Technopark 190-1, Sangdaewon-dong, Jungwon-gu Seongnam-si Gyeonggi-do 462-727 (KR) (For All Designated States Except US).
LEE, Keun Ho [KR/KR]; (KR) (For US Only).
LEE, Hae Ryong [KR/KR]; (KR) (For US Only).
YOO, Young Jong [KR/KR]; (KR) (For US Only).
PARK, Nam Gyu [KR/KR]; (KR) (For US Only).
MIN, Hong Ki [KR/KR]; (KR) (For US Only)
Inventors: LEE, Keun Ho; (KR).
LEE, Hae Ryong; (KR).
YOO, Young Jong; (KR).
PARK, Nam Gyu; (KR).
MIN, Hong Ki; (KR)
Agent: AIP PATENT & LAW FIRM; Shinwon Bldg. 8F 823-14, Yeoksam-dong, Gangnam-gu Seoul 135-933 (KR)
Priority Data:
10-2008-0047110 21.05.2008 KR
Title (EN) IN-LINE DIE CLEANING DEVICE AND CLEANING METHOD EMPLOYING PLASMA
(FR) DISPOSITIF DE NETTOYAGE DE MATRICES EN LIGNE ET PROCÉDÉ DE NETTOYAGE PAR PLASMA
(KO) 플라즈마를 이용하는 인라인 금형 세정장치 및 세정방법
Abstract: front page image
(EN)Disclosed is an in-line die cleaning device for plasma cleaning, in an in-line fashion, at least one of the upper die and the lower die provided in a semiconductor moulding apparatus. The disclosed in-line die cleaning device comprises: a cleaning module which is constituted in such a way as to form a chamber when mated with at least one of the upper die and the lower die, and to generate plasma within the chamber; and a conveyor unit for conveying the cleaning module from a starting position to a cleaning standby position between the upper die and the lower die, wherein in the cleaning standby position, the cleaning module is raised by means of the lower die and is mated with the upper die.
(FR)L'invention concerne un dispositif de nettoyage de matrices en ligne pour le nettoyage au plasma, selon une configuration en ligne, la matrice supérieure et/ou la matrice inférieure étant placées dans un appareil de moulage de semi-conducteurs. Ce dispositif de nettoyage de matrices en ligne comprend : un module de nettoyage qui est conçu de manière à former une chambre lorsqu'il est associé à la matrice supérieure et/ou à la matrice inférieure et pour générer un plasma dans cette chambre; ainsi qu'une unité de transport servant à transporter le module de nettoyage d'une position de départ à une position d'attente de nettoyage entre la matrice supérieure et la matrice inférieure. Dans la position d'attente de nettoyage, le module de nettoyage est levé au moyen de la matrice inférieure et associé à la matrice supérieure.
(KO)여기에서는, 반도체 몰딩 장비에 설치된 상부 금형과 하부 금형 중 적어도 하나의 금형을 인라인 방식으로 플라즈마 세정하는 인라인 금형 세정장치가 개시된다. 개시된 인라인 금형 세정장치는, 상부 금형과 하부 금형 중 적어도 하나의 금형과 합치될 때 챔버를 형성하고, 상기 챔버 내에 플라즈마를 발생시키도록 구성된 세정모듈과, 상기 세정모듈을 출발위치로부터 상기 상부 금형과 상기 하부 금형 사이의 세정 대기 위치로 이송시키는 이송유닛을 포함하되, 상기 세정모듈은, 상기 세정 대기 위치에서, 상기 하부 금형에 의해 들어올려져 상기 상부 금형과 합치된다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)