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1. (WO2009141931) BARRIER FILM FORMING MATERIAL AND PATTERN FORMING METHOD USING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/141931    International Application No.:    PCT/JP2009/000210
Publication Date: 26.11.2009 International Filing Date: 21.01.2009
IPC:
H01L 21/027 (2006.01), G03F 7/11 (2006.01), G03F 7/38 (2006.01)
Applicants: PANASONIC CORPORATION [JP/JP]; 1006, Oaza Kadoma, Kadoma-shi, Osaka 5718501 (JP) (For All Designated States Except US).
ENDOU, Masayuki; (For US Only).
SASAGO, Masaru; (For US Only)
Inventors: ENDOU, Masayuki; .
SASAGO, Masaru;
Agent: MAEDA, Hiroshi; Osaka-Marubeni Bldg., 5-7, Hommachi 2-chome, Chuo-ku, Osaka-shi, Osaka, 5410053 (JP)
Priority Data:
2008-132147 20.05.2008 JP
Title (EN) BARRIER FILM FORMING MATERIAL AND PATTERN FORMING METHOD USING SAME
(FR) MATÉRIAU DE FORMATION DE FILM BARRIÈRE ET PROCÉDÉ DE FORMATION DE MOTIF UTILISANT LEDIT MATÉRIAU
(JA) バリア膜形成用材料及びそれを用いたパターン形成方法
Abstract: front page image
(EN)A resist film (102) is formed on a substrate (101), and a barrier film (103), which contains both nano particles composed of an inorganic oxide (SiO2) and an alicyclic compound (1-adamantanol) which has an alkali soluble group, is formed on said formed resist film (102). Subsequently, pattern exposure is performed by selectively irradiating the resist film (102) with exposure light through a liquid (104) and the barrier film (103) wherein the liquid (104) is distributed on the barrier film (103). Subsequently, developing of the resist film (102) that has undergone pattern exposure is performed to remove the barrier film (103) and to form a resist pattern (102a) from the resist film (102).
(FR)Un film de résine photosensible (102) est formé sur un substrat (101), et un film barrière (103), qui contient des nanoparticules composées d'un oxyde inorganique (SiO2) et d'un composé alicyclique (1-adamantanol) qui présente un groupe soluble dans les alcalis, est formé sur ledit film de résine photosensible (102). Ultérieurement, une exposition de motif est mise en oeuvre par irradiation sélective du film de résine photosensible (102) à l'aide d'une lumière d'exposition à travers un liquide (104) et le film barrière (103), le liquide (104) étant distribué sur le film barrière (103). Ensuite, un développement du film de résine photosensible (102) qui a subi une exposition de motif est mis en oeuvre pour éliminer le film barrière (103) et pour former un motif de résine photosensible (102a) à partir du film de résine photosensible (102).
(JA) 基板(101)の上にレジスト膜(102)を形成し、形成したレジスト膜(102)の上に、無機酸化物(SiO)からなるナノ粒子とアルカリ可溶性基を有する脂環式化合物(1-アダマンタノール)とを含むバリア膜(103)を形成する。続いて、バリア膜(103)の上に液体(104)を配した状態で、液体(104)及びバリア膜(103)を介してレジスト膜(102)に露光光を選択的に照射することによりパターン露光を行う。続いて、パターン露光されたレジスト膜(102)に対して現像を行って、バリア膜(103)を除去すると共にレジスト膜(102)からレジストパターン(102a)を形成する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)