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Machine translation
1. (WO2009140622) POLISHING PAD WITH ENDPOINT WINDOW AND SYSTEMS AND METHOD USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/140622    International Application No.:    PCT/US2009/044187
Publication Date: 19.11.2009 International Filing Date: 15.05.2009
IPC:
B24B 37/04 (2006.01), B24D 13/14 (2006.01), H01L 21/304 (2006.01), B24B 49/12 (2006.01)
Applicants: 3M INNOVATIVE PROPERTIES COMPANY [US/US]; 3m Center Post Office Box 33427 Saint Paul, MN 55133-3427 (US) (For All Designated States Except US).
SEMIQUEST, INC. [US/US]; 2363 Bering Drive San Jose, CA 95131 (US) (For All Designated States Except US).
BAJAJ, Rajeev [US/US]; (US) (For US Only).
FISHER, Stephen, M. [US/US]; (US) (For US Only).
JOSEPH, William, D. [US/US]; (US) (For US Only)
Inventors: BAJAJ, Rajeev; (US).
FISHER, Stephen, M.; (US).
JOSEPH, William, D.; (US)
Agent: KWAK, Jessica, H.; (US)
Priority Data:
61/053,429 15.05.2008 US
Title (EN) POLISHING PAD WITH ENDPOINT WINDOW AND SYSTEMS AND METHOD USING THE SAME
(FR) TAMPON DE POLISSAGE MUNI D'UNE FENÊTRE DE POINT FINAL ET SYSTÈMES ET PROCÉDÉS FAISANT APPEL AUDIT TAMPON
Abstract: front page image
(EN)A polishing pad including a path therethrough to transmit a signal for in situ monitoring of an endpoint in a polishing operation. In one embodiment, the polishing pad includes a polishing composition distribution layer on a first side of a guide plate and a support layer on an opposed second side of a guide plate. The guide plate retains a plurality of polishing elements that extend along a first direction substantially normal to a plane including the polishing pad and through the polishing composition distribution layer. The polishing pad includes an optical path along the first direction and through a thickness of the pad.
(FR)L'invention porte sur un tampon de polissage traversé par un chemin qui permet la transmission d'un signal destiné à la surveillance in situ d'un point final au cours d'une opération de polissage. Dans un mode de réalisation, le tampon de polissage comprend une couche de distribution de composition de polissage formée sur un premier côté d'une plaque-guide, et une couche de support formée d'un second côté opposé de la plaque-guide. La plaque-guide retient une pluralité d'éléments de polissage qui s'étendent dans une première direction sensiblement perpendiculaire à un plan comprenant le tampon de polissage, et à travers la couche de distribution de composition de polissage. Le tampon de polissage comprend un chemin optique qui s'étend dans la première direction, à travers l'épaisseur du tampon.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)