WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2009136942) SCREEN DESIGN FOR PROCESS VARIATION ARTIFACT REDUCTION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/136942    International Application No.:    PCT/US2008/063254
Publication Date: 12.11.2009 International Filing Date: 09.05.2008
IPC:
G06F 3/12 (2006.01), G06F 3/14 (2006.01)
Applicants: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. [US/US]; 11445 Compaq Center Drive West Houston, TX 77070 (US) (For All Designated States Except US).
FISCHER, Mani [IL/IL]; (IL) (For US Only).
SHAKED, Doron [IL/IL]; (IL) (For US Only)
Inventors: FISCHER, Mani; (IL).
SHAKED, Doron; (IL)
Agent: HEMINGER, Susan, E.; Hewlett-Packard Company Intellectual Property Administration Mail Stop 35 P.O. Box 272400 Fort Collins, CO 80527-2400 (US)
Priority Data:
Title (EN) SCREEN DESIGN FOR PROCESS VARIATION ARTIFACT REDUCTION
(FR) CONCEPTION D'ÉCRAN POUR RÉDUIRE LES ARTÉFACTS DE VARIATION DE PROCESSUS
Abstract: front page image
(EN)In a method for designing a halftone screen configured to reduce artifacts in a printed image, artifacts due to a process variation resulting from printing of the image through use of a halftone screen design are modeled and the halftone screen is designed to have threshold values that substantially reduce the artifacts due to the process variation.
(FR)Dans un procédé de conception d’un écran en demi-teinte configuré pour réduire les artéfacts dans une image imprimée, les artéfacts dus à une variation de processus résultant d'une impression de l'image par l'utilisation d'une conception d'écran en demi-teinte sont modélisés et l'écran en demi-teinte est conçu pour avoir des valeurs de seuil qui réduisent sensiblement les artéfacts dus à la variation de processus.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)