WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2009136725) SUPER-RESOLUTION DIGITAL LITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/136725    International Application No.:    PCT/KR2009/002368
Publication Date: 12.11.2009 International Filing Date: 06.05.2009
IPC:
H01L 21/027 (2006.01)
Applicants: EO TECHNICS., LTD [KR/KR]; 864-4, Gwanyang2-dong Dangan-gu Anyang-si Gyeonggi-do 431-062 (KR) (For All Designated States Except US).
SEO, Manseung [KR/KR]; (KR) (For US Only).
KIM, Haeryung [KR/KR]; (KR) (For US Only)
Inventors: SEO, Manseung; (KR).
KIM, Haeryung; (KR)
Agent: Y.P.LEE, MOCK & PARTNERS; (KR)
Priority Data:
10-2008-0041846 06.05.2008 KR
Title (EN) SUPER-RESOLUTION DIGITAL LITHOGRAPHY
(FR) LITHOGRAPHIE NUMÉRIQUE À TRÈS HAUTE RÉSOLUTION
(KO) 초분해능 디지털 리소그래피
Abstract: front page image
(EN)The present invention relates to super-resolution digital lithography which uses a spatial light modulator. In the super-resolution digital lithography, focus is adjusted to a pitch which is the unit distance of movement on an exposed substrate so that a projection structure formed on the substrate may be analyzed based on the correlation between the movement of the beams projected on the substrate and the length of time of light modulation. The unit distance corresponds to the unit time of light modulation on a fine mirror. In addition, a resoluble degree, a super-resolution and a scan-ratio are defined mathematically in the super-resolution digital lithography. The projection structure and the super-resolution do not change due to the coprime principle between the defined resolution and the defined scan-ratio even though the pitch is increased. Therefore, the efficiency and accuracy of scanning are secured at the same time in the super-resolution digital lithography.
(FR)La présente invention concerne la lithographie numérique à très haute résolution qui fait appel à un modulateur spatial de lumière. En lithographie numérique à très haute résolution, on fait la mise au point sur un pas qui est l'unité de distance pour le déplacement sur un substrat exposé de sorte qu'une structure en saillie formée sur le substrat puisse être analysée sur la base de la corrélation entre le mouvement des faisceaux projetés sur le substrat et la durée de la modulation de lumière. L'unité de distance correspond à l'unité de temps de la modulation de lumière sur un miroir fin. De plus, en lithographie numérique à très haute résolution, un degré séparable, une très haute résolution et un taux d'exploration sont définis mathématiquement. La structure en saillie et la très haute résolution ne changent pas du fait du principe des nombres co-premiers entre la résolution définie et le taux d'exploration défini même si le pas est augmenté. Par conséquent, l'efficacité et la précision de l'exploration sont assurés simultanément en lithographie numérique à très haute résolution.
(KO)본 발명은 공간 광 변조기를 이용하는 디지털 리소그래피(digital lithography)에 있어서, 미세미러의 단위 광 변조 시간에 해당하는 피노광체인 기판의 단위 이동거리인 피치에 초점을 맞추어, 기판에 투영되는 빔들이 기판의 이동과 광 변조 시간의 상관 관계에 따라 기판상에 형성하는 투영구조를 분석하고, 해상도(resoluble degree)와 초분해능(super-resolution)과 스캔비(scan-ratio)를 수학적으로 정의하고, 정의된 해상도와 스캔비의 서로소(서로素, coprime)의 원리에 의하여 피치를 증가시키더라도 투영구조와 초분해능이 그대로 유지되게 함으로써, 스캔의 효율성과 정밀도가 동시에 보장되는 초분해능 디지털 리소그래피(Super-Resolution Digital Lithography)에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)