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1. (WO2009135182) COMBINATORIAL PLASMA ENHANCED DEPOSITION TECHNIQUES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/135182    International Application No.:    PCT/US2009/042611
Publication Date: 05.11.2009 International Filing Date: 01.05.2009
IPC:
H01L 21/205 (2006.01)
Applicants: INTERMOLECULAR, INC. [US/US]; 2865 Zanker Rd. San Jose, CA 95134 (US) (For All Designated States Except US).
SHANKER, Sunil [IN/US]; (US) (For US Only).
CHIANG, Tony [US/US]; (US) (For US Only)
Inventors: SHANKER, Sunil; (US).
CHIANG, Tony; (US)
Agent: HARTOUNIAN, Arlen; (US)
Priority Data:
61/050,159 02.05.2008 US
12/433,842 30.04.2009 US
Title (EN) COMBINATORIAL PLASMA ENHANCED DEPOSITION TECHNIQUES
(FR) TECHNIQUES COMBINATOIRES AMÉLIORÉES DE DÉPÔT DE PLASMA
Abstract: front page image
(EN)Combinatorial plasma enhanced deposition techniques are described, including designating multiple regions of a substrate, providing a precursor to at least a first region of the multiple regions, and providing a plasma to the first region to deposit a first material on the first region formed using the first precursor, wherein the first material is different from a second material formed on a second region of the substrate.
(FR)Cette invention se rapporte à des techniques combinatoires améliorées de dépôt de plasma qui comprennent la désignation de multiples régions d'un substrat, la fourniture d’un précurseur au moins à une première région parmi les multiples régions et la fourniture d’un plasma à la première région pour déposer un premier matériau sur la première région formée à l'aide du premier précurseur, le premier matériau étant différent d'un second matériau formé sur une deuxième région du substrat.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)