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Machine translation
1. (WO2009133196) METHOD FOR PROVIDING OXIDE LAYERS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/133196    International Application No.:    PCT/EP2009/055312
Publication Date: 05.11.2009 International Filing Date: 30.04.2009
IPC:
H01L 21/316 (2006.01)
Applicants: IMEC [BE/BE]; Kapeldreef 75 B-3001 Leuven (BE) (For All Designated States Except US).
SOUSSAN, Philippe [FR/FR]; (FR) (For US Only).
BEYNE, Eric [BE/BE]; (BE) (For US Only).
MULLER, Philippe [FR/FR]; (FR) (For US Only)
Inventors: SOUSSAN, Philippe; (FR).
BEYNE, Eric; (BE).
MULLER, Philippe; (FR)
Agent: HERTOGHE, Kris; (BE)
Priority Data:
61/050,092 02.05.2008 US
Title (EN) METHOD FOR PROVIDING OXIDE LAYERS
(FR) PROCÉDÉ POUR LA FABRICATION DE COUCHES D'OXYDE
Abstract: front page image
(EN)The present invention provides a method for providing an oxide layer (9) on a semiconductor substrate (1). The method comprises obtaining a semiconductor substrate (1), for example comprising a three-dimensional structure, which may comprise at least one hole (5), and forming an oxide layer (9) on the substrate, for example on the three-dimensional structure, by anodising the substrate in an acidic electrolyte solution.
(FR)La présente invention porte sur un procédé de fabrication d'une couche d'oxyde (9) sur un substrat de semi-conducteur (1). Le procédé consiste à obtenir un substrat de semi-conducteur (1), dont la structure est par exemple tridimensionnelle et qui peut comporter au moins un trou (5), et former une couche d'oxyde (9) sur le substrat, par exemple sur la structure tridimensionnelle, par anodisation du substrat dans une solution électrolytique acide.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)