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Machine translation
1. (WO2009132800) SUPPORT STRUCTURE, INSPECTION APPARATUS, LITHOGRAPHIC APPARATUS AND METHODS FOR LOADING AND UNLOADING SUBSTRATES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/132800    International Application No.:    PCT/EP2009/002959
Publication Date: 05.11.2009 International Filing Date: 23.04.2009
IPC:
G03F 7/20 (2006.01), H01L 21/687 (2006.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; De Run 6501 NL-5504 DR Veldhoven (NL) (For All Designated States Except US).
SEIJGER, Olav, Johannes [NL/NL]; (NL) (For US Only).
KOK, Martinus, Joseph [NL/NL]; (NL) (For US Only).
KERSSEMAKERS, Sander [NL/NL]; (NL) (For US Only)
Inventors: SEIJGER, Olav, Johannes; (NL).
KOK, Martinus, Joseph; (NL).
KERSSEMAKERS, Sander; (NL)
Agent: VAN DEN HOOVEN, Jan; ASML Corporate Intellectual Property P.O. Box 324 NL-5500 AH Veldhoven (NL)
Priority Data:
61/071,440 29.04.2008 US
Title (EN) SUPPORT STRUCTURE, INSPECTION APPARATUS, LITHOGRAPHIC APPARATUS AND METHODS FOR LOADING AND UNLOADING SUBSTRATES
(FR) STRUCTURE DE SUPPORT, APPAREIL DE CONTRÔLE, APPAREIL LITHOGRAPHIQUE ET PROCÉDÉS DE CHARGEMENT ET DE DÉCHARGEMENT DE SUBSTRATS
Abstract: front page image
(EN)A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.
(FR)Support de substrats, configuré de façon à supporter un substrat pendant un processus dans un système de lithographie et comprenant une structure de levage configurée de façon à déplacer le substrat entre une première position, où une surface de levage de la structure de levage supporte le substrat dans une position écartée par rapport à une surface d’appui du support de substrat, et une deuxième position, où la structure de levage n’empêche pas le substrat d’être supporté par une surface d’appui du support de substrat. Lors des déplacements entre la première et la deuxième position, le substrat est animé d’une combinaison d’un mouvement sensiblement perpendiculaire à un plan parallèle à la surface d’appui et d’un mouvement sensiblement parallèle à la surface d’appui.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)